Removal of moisture contamination from porous polymeric low-k dielectric films

Asad Iqbal, Harpreet Juneja, Junpin Yao, Farhang Shadman

Research output: Contribution to journalArticle

8 Citations (Scopus)

Abstract

Ultra low-k dielectrics are expected to replace SiO 2 as the interlayer dielectric for the next-generation microelectronic devices. A challenge facing the integration of these dielectrics in manufacturing is their interactions with gaseous contaminants, such as moisture, and the resulting change in their properties. The physical and chemical interactions of moisture with porous spin-on dielectric material are investigated using temperature- and concentration-programmed exposure and purge sequence together with trace moisture analysis, using atmospheric pressure ionization mass spectrometry. The model compound in this study is methylsilsesquioxane, deposited and treated under typical manufacturing conditions. A process model is developed that provides information on the mechanism and kinetics of moisture uptake and release in thin porous films. The model elucidates the effect of film properties on the contamination uptake as well as outgassing; it also provides a valuable tool for designing an optimum process for contamination control and removal in porous films.

Original languageEnglish (US)
Pages (from-to)1586-1593
Number of pages8
JournalAICHE Journal
Volume52
Issue number4
DOIs
StatePublished - Apr 2006

Fingerprint

Atmospheric Pressure
Dielectric films
Mass Spectrometry
Contamination
Moisture
Equipment and Supplies
Temperature
Degassing
Microelectronics
Atmospheric pressure
Ionization
Mass spectrometry
Impurities
Kinetics
Low-k dielectric

Keywords

  • Desorption
  • Dielectrics
  • Methylsilsesquioxane (MSQ)
  • Moisture
  • Outgassing

ASJC Scopus subject areas

  • Biotechnology
  • Chemical Engineering(all)
  • Mechanical Engineering
  • Environmental Engineering
  • Polymers and Plastics

Cite this

Removal of moisture contamination from porous polymeric low-k dielectric films. / Iqbal, Asad; Juneja, Harpreet; Yao, Junpin; Shadman, Farhang.

In: AICHE Journal, Vol. 52, No. 4, 04.2006, p. 1586-1593.

Research output: Contribution to journalArticle

Iqbal, Asad ; Juneja, Harpreet ; Yao, Junpin ; Shadman, Farhang. / Removal of moisture contamination from porous polymeric low-k dielectric films. In: AICHE Journal. 2006 ; Vol. 52, No. 4. pp. 1586-1593.
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