Removal of process-generated organic impurities from recycled water in semiconductor fabs

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Citation (Scopus)

Abstract

Oxidation is one of the most effective ways of removing organic impurities from water or recycled waste water. The kinetics and the mechanism of oxidation of two types of organic impurities were studied: soluble but recalcitrant organic impurities and the organic particles such as photo-resists, entering the recycle streams. The UV photolysis and photocatalytic oxidation of organic impurities in ultrapure water were studied in a pilot ultrapure water plant. A novel photocatalytic filter was developed by depositing a layer of photocatalytically active material on an inorganic filter substrate. A number of naturally accruing soluble and particulate organic impurities as well as surfactants were used as model impurities in this study. The photocatalyst enhanced the oxidation by both increasing the adsorption on the filter and enhancing the oxidation reaction through the catalyzed formation of active radicals.

Original languageEnglish (US)
Title of host publicationProceedings of SPIE - The International Society for Optical Engineering
EditorsSusan K. Jones
Pages300-307
Number of pages8
Volume2725
StatePublished - 1996
EventMetrology, Inspection, and Process Control for Microlithography X - Santa Clara, CA, USA
Duration: Mar 11 1996Mar 13 1996

Other

OtherMetrology, Inspection, and Process Control for Microlithography X
CitySanta Clara, CA, USA
Period3/11/963/13/96

Fingerprint

Impurities
Semiconductor materials
Oxidation
Water
Photolysis
Photocatalysts
Wastewater
Surface active agents
Adsorption
Kinetics
Substrates

ASJC Scopus subject areas

  • Engineering(all)

Cite this

Chen, G., & Shadman, F. (1996). Removal of process-generated organic impurities from recycled water in semiconductor fabs. In S. K. Jones (Ed.), Proceedings of SPIE - The International Society for Optical Engineering (Vol. 2725, pp. 300-307)

Removal of process-generated organic impurities from recycled water in semiconductor fabs. / Chen, G.; Shadman, Farhang.

Proceedings of SPIE - The International Society for Optical Engineering. ed. / Susan K. Jones. Vol. 2725 1996. p. 300-307.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Chen, G & Shadman, F 1996, Removal of process-generated organic impurities from recycled water in semiconductor fabs. in SK Jones (ed.), Proceedings of SPIE - The International Society for Optical Engineering. vol. 2725, pp. 300-307, Metrology, Inspection, and Process Control for Microlithography X, Santa Clara, CA, USA, 3/11/96.
Chen G, Shadman F. Removal of process-generated organic impurities from recycled water in semiconductor fabs. In Jones SK, editor, Proceedings of SPIE - The International Society for Optical Engineering. Vol. 2725. 1996. p. 300-307
Chen, G. ; Shadman, Farhang. / Removal of process-generated organic impurities from recycled water in semiconductor fabs. Proceedings of SPIE - The International Society for Optical Engineering. editor / Susan K. Jones. Vol. 2725 1996. pp. 300-307
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