Removal of trace surfactant from ultrapure water though UV photolysis and photocatalytic oxidation

Guoqing Chen, Farhang Shadman

Research output: Contribution to conferencePaper

Abstract

The UV photolysis and photocatalytic oxidation of trace surfactant in ultrapure water was studied in a pilot ultrapure water plant. Two kinds of low mercury vapor pressure UV lamps were used. A novel photocatalytic filter was developed by growing a TiO2 (anatase) layer on a sintered titanium filter. Two commercial surfactants, FC99 and FC170C were test as model compounds. Experimental results show that FC170C was photo-oxidized fast especially under the UV185. The photocatalyst enhanced the oxidation in both increasing the reaction rate and lowering the residual concentration. The shorter UV185 enhanced such photocatalytic effect. FC99 was found to be recalcitrant to both UV wavelengths while the photocatalyst enhanced the oxidation significantly. The UV wavelength had no effect on the photocatalytic effect for this model compound. The possible methods to improve the photocatalytic filter were discussed.

Original languageEnglish (US)
Pages111-124
Number of pages14
StatePublished - Dec 1 1996
EventProceedings of the 1996 Semiconductor Pure Water and Chemicals - Santa Clara, CA, USA
Duration: Mar 4 1996Mar 7 1996

Other

OtherProceedings of the 1996 Semiconductor Pure Water and Chemicals
CitySanta Clara, CA, USA
Period3/4/963/7/96

ASJC Scopus subject areas

  • Water Science and Technology
  • Electronic, Optical and Magnetic Materials

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    Chen, G., & Shadman, F. (1996). Removal of trace surfactant from ultrapure water though UV photolysis and photocatalytic oxidation. 111-124. Paper presented at Proceedings of the 1996 Semiconductor Pure Water and Chemicals, Santa Clara, CA, USA, .