Repair of porous MSQ (p-MSQ) films using monochlorosilanes dissolved in supercritical Co2

Research output: Chapter in Book/Report/Conference proceedingConference contribution

9 Scopus citations

Abstract

Fourier transform infrared (FTIR) spectroscopy, contact angle, and electrical measurements were used to study porous methylsilsesquioxane (p-MSQ) films (JSR LKD 5109) processed with alkylmonochlorosilanes having chain lengths of one to eighteen carbon atoms dissolved in supercritical carbon dioxide at 155-185 atm and 55-60°C to repair oxygen ashing damage. The FTIR results showed that all chemistries reacted with silanol groups on the surface of the pores producing covalent Si-O-Si bonds. Self-condensation between the alkylsilanols with chain lengths above four carbon atoms produced a physisorbed residue, which was partially removed after rinsing with pure scCO2. The hydrophobicity of the blanket p-MSQ surface was recovered, while the initial dielectric constant of 2.4 for the blanket p-MSQ surface was restored after treatment. With an increase in the length of the alkyl chain, the contact angle increased from 84° to 108° and the dielectric constant measured on metal-insulator-semiconductor capacitors was approximately constant in the range 2.4 ± 0.05. The monochlorosilanes restore the dielectric constant and surface properties of mesoporous p-MSQ and are candidate pore sealing additives.

Original languageEnglish (US)
Title of host publicationUltra Clean Processing of Silicon Surfaces VII
EditorsPaul Mertens, Marc Meuris, Marc Heyns
PublisherTrans Tech Publications Ltd
Pages323-326
Number of pages4
ISBN (Print)9783908451068
DOIs
StatePublished - Jan 1 2005
Event7th International Symposium on Ultra Clean Processing of Silicon Surfaces, UCPSS 2004 - Brussels, Belgium
Duration: Sep 20 2004Sep 22 2004

Publication series

NameSolid State Phenomena
Volume103-104
ISSN (Print)1012-0394
ISSN (Electronic)1662-9779

Other

Other7th International Symposium on Ultra Clean Processing of Silicon Surfaces, UCPSS 2004
CountryBelgium
CityBrussels
Period9/20/049/22/04

Keywords

  • Contact angle
  • Electrical measurement
  • FTIR
  • Film repair
  • Monochlorosilane
  • Pore capping
  • Porous MSQ
  • Supercritical CO

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics
  • Materials Science(all)
  • Condensed Matter Physics

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