Research accomplishments at the University of Arizona SEMATECH Center of Excellence for contamination/defect assessment and control

H. G. Parks, J. F. O'Hanlon, F. Shadman

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

The Arizona SEMATECH Center of Excellence (SCOE) was established in May of 1988. The SCOE is engaged in research on a broad front to understand and control contamination which causes yield-limiting defects in submicron ULSI circuits. Sandia National Laboratory personnel are integrated with UA personnel in the SCOE research. The focus of the research is on contaminants, both particulates and homogeneous or distributed, which originate in, are caused by, or are transported and deposited by process gases and chemicals or process equipment. Further, the work involves investigating the mapping from contaminants and contaminant levels to circuit defects for submicron processes and circuit technologies. Results achieved during the three years of SCOE's existence are described.

Original languageEnglish (US)
Title of host publicationIEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop
PublisherPubl by IEEE
Pages9-16
Number of pages8
ISBN (Print)0780301528
StatePublished - Jan 1 1992
Externally publishedYes
Event1991 IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop - Boston, MA, USA
Duration: Oct 21 1991Oct 23 1991

Publication series

NameIEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop

Other

Other1991 IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop
CityBoston, MA, USA
Period10/21/9110/23/91

    Fingerprint

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Engineering(all)
  • Industrial and Manufacturing Engineering
  • Electrical and Electronic Engineering

Cite this

Parks, H. G., O'Hanlon, J. F., & Shadman, F. (1992). Research accomplishments at the University of Arizona SEMATECH Center of Excellence for contamination/defect assessment and control. In IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop (pp. 9-16). (IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop). Publ by IEEE.