Resistance-limited kinetics and use of equivalent circuits for electrochromic intercalation devices

M. Denesuk, Donald R Uhlmann

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

The hypothesis of resistance-limited device behavior and the efficacy of equivalent circuits in modeling the behavior of electrochromic devices are considered. Two types of electrochromic systems, both based on tungsten oxide, are investigated. One is an all-solid-state-stack device, and the other is an aqueous, three-electrode cell system. The general appropriateness of the resistance-limited hypothesis is well-demonstrated, implying that diffusive processes are not important kinetically. The results suggest that development of useful equivalent circuits for electrochromic devices, which would prove invaluable for systems integration, should be pursued aggressively.

Original languageEnglish (US)
Title of host publicationProceedings of SPIE - The International Society for Optical Engineering
PublisherSociety of Photo-Optical Instrumentation Engineers
Pages132-140
Number of pages9
Volume3788
StatePublished - 1999
EventProceedings of the 1999 Switchable Materials and Flat Panel Displays - Denver, CO, USA
Duration: Jul 21 1999Jul 22 1999

Other

OtherProceedings of the 1999 Switchable Materials and Flat Panel Displays
CityDenver, CO, USA
Period7/21/997/22/99

Fingerprint

Electrochromic devices
Intercalation
equivalent circuits
intercalation
Equivalent circuits
Kinetics
kinetics
Tungsten
systems integration
Electrodes
Oxides
tungsten oxides
solid state
electrodes
cells

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Condensed Matter Physics

Cite this

Denesuk, M., & Uhlmann, D. R. (1999). Resistance-limited kinetics and use of equivalent circuits for electrochromic intercalation devices. In Proceedings of SPIE - The International Society for Optical Engineering (Vol. 3788, pp. 132-140). Society of Photo-Optical Instrumentation Engineers.

Resistance-limited kinetics and use of equivalent circuits for electrochromic intercalation devices. / Denesuk, M.; Uhlmann, Donald R.

Proceedings of SPIE - The International Society for Optical Engineering. Vol. 3788 Society of Photo-Optical Instrumentation Engineers, 1999. p. 132-140.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Denesuk, M & Uhlmann, DR 1999, Resistance-limited kinetics and use of equivalent circuits for electrochromic intercalation devices. in Proceedings of SPIE - The International Society for Optical Engineering. vol. 3788, Society of Photo-Optical Instrumentation Engineers, pp. 132-140, Proceedings of the 1999 Switchable Materials and Flat Panel Displays, Denver, CO, USA, 7/21/99.
Denesuk M, Uhlmann DR. Resistance-limited kinetics and use of equivalent circuits for electrochromic intercalation devices. In Proceedings of SPIE - The International Society for Optical Engineering. Vol. 3788. Society of Photo-Optical Instrumentation Engineers. 1999. p. 132-140
Denesuk, M. ; Uhlmann, Donald R. / Resistance-limited kinetics and use of equivalent circuits for electrochromic intercalation devices. Proceedings of SPIE - The International Society for Optical Engineering. Vol. 3788 Society of Photo-Optical Instrumentation Engineers, 1999. pp. 132-140
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