Retroreflecting ellipsometer for measuring the birefringence of optical disk substrates

Hong Fu, T. Goodman, S. Sugaya, J. K. Erwin, M. Mansuripur

Research output: Contribution to journalArticle

6 Scopus citations

Abstract

A retroreflecting ellipsometer has been constructed for measuring the birefringence of optical disk substrates. In contrast to conventional ellipsometers with two mechanical arms, this system has only one arm along which both the incident and reflected beams travel. This construction eliminates the mechanical limitations of conventional ellipsometers, thereby permitting normal incidence on the sample. In addition, the single arm is adjustable in two dimensions, with the polar incident angle, Θinc, varying from 0° to 70°, and the azimuthal incident angle, Φinc, varying from 0° to 360°. The condition of normal incidence permits accurate measurement of in-plane birefringence. The adjustability of both Θinc and Φinc is necessary for the measurement of possible tilts of the index ellipsoid, and also for the variation of birefringence through the substrate thickness. Measurement results showing the useful features of the equipment are presented. The optics of the hemispherical assembly used for retroreflection as well as for the elimination of undesirable refractions are also studied by use of the zemax lens design program.

Original languageEnglish (US)
Pages (from-to)31-39
Number of pages9
JournalApplied optics
Volume34
Issue number1
DOIs
StatePublished - Jan 1 1995

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ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics
  • Engineering (miscellaneous)
  • Electrical and Electronic Engineering

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