Reverse optimization of a Shack-Hartmann wavefront sensor

Daniel G. Smith, John E. Greivenkamp

Research output: Contribution to journalConference articlepeer-review

1 Scopus citations

Abstract

Reverse optimization has been used in other metrology instruments to obtain good calibration results. This paper describes three approaches for using reverse optimization with a Shack-Hartmann wavefront sensor. Two of the approaches give some insight into problems encountered in reverse optimization and a third approach, involving an aberration function model of the Shack-Hartmann wavefront sensor, resolves these issues. Simulated results are given and the approach is shown to produce calibrated wavefront measurements accurate to one part in one thousand, in the presence of significant centroid noise.

Original languageEnglish (US)
Article number586915
Pages (from-to)1-6
Number of pages6
JournalProceedings of SPIE - The International Society for Optical Engineering
Volume5869
DOIs
StatePublished - Dec 23 2005
EventOptical Manufacturing and Testing VI - San DIego, CA, United States
Duration: Jul 31 2005Aug 1 2005

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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