Revisiting the removal rate model for oxide CMP

Jamshid Sorooshian, Leonard Borucki, David Stein, Robert Timon, Dale Hetherington, Ara Philipossian

Research output: Contribution to journalArticle

27 Citations (Scopus)

Abstract

This study seeks to explain removal rate trends and scatter in thermal silicon dioxide and PECVD tetraethoxysilane-sourced silicon dioxide (PE-TEOS) CMP using an augmented version of the Langmuir-Hinshelwood mechanism. The proposed model combines the chemical and mechanical facets of interlevel dielectric (ILD) CMP and hypothesizes that the chemical reaction temperature is determined by transient flash heating. The agreement between the model and data suggests that the main source of apparent scatter in removal rate data plotted as rate versus pressure times velocity is competition between mechanical and thermochemical mechanisms. A method of visualizing removal rate data is described that shows, apart from any particular interpretative theory, that a smooth and easily interpretable surface underlies the apparent scatter.

Original languageEnglish (US)
Pages (from-to)639-651
Number of pages13
JournalJournal of Tribology
Volume127
Issue number3
DOIs
StatePublished - Jul 2005

Fingerprint

Cytidine Monophosphate
Oxides
Silicon Dioxide
oxides
Silica
Plasma enhanced chemical vapor deposition
silicon dioxide
Chemical reactions
flash
Heating
flat surfaces
chemical reactions
Polymers
trends
heating
Temperature
temperature

Keywords

  • Flash heating
  • Lim-Ashby wear plot
  • Oxide
  • Preston
  • Removal rate
  • TEOS

ASJC Scopus subject areas

  • Mechanical Engineering

Cite this

Sorooshian, J., Borucki, L., Stein, D., Timon, R., Hetherington, D., & Philipossian, A. (2005). Revisiting the removal rate model for oxide CMP. Journal of Tribology, 127(3), 639-651. https://doi.org/10.1115/1.1866168

Revisiting the removal rate model for oxide CMP. / Sorooshian, Jamshid; Borucki, Leonard; Stein, David; Timon, Robert; Hetherington, Dale; Philipossian, Ara.

In: Journal of Tribology, Vol. 127, No. 3, 07.2005, p. 639-651.

Research output: Contribution to journalArticle

Sorooshian, J, Borucki, L, Stein, D, Timon, R, Hetherington, D & Philipossian, A 2005, 'Revisiting the removal rate model for oxide CMP', Journal of Tribology, vol. 127, no. 3, pp. 639-651. https://doi.org/10.1115/1.1866168
Sorooshian J, Borucki L, Stein D, Timon R, Hetherington D, Philipossian A. Revisiting the removal rate model for oxide CMP. Journal of Tribology. 2005 Jul;127(3):639-651. https://doi.org/10.1115/1.1866168
Sorooshian, Jamshid ; Borucki, Leonard ; Stein, David ; Timon, Robert ; Hetherington, Dale ; Philipossian, Ara. / Revisiting the removal rate model for oxide CMP. In: Journal of Tribology. 2005 ; Vol. 127, No. 3. pp. 639-651.
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