Rock and roll polishing: A process for optical surface polishing

José M. Sasián, Michael B. North-Morris, Geoffrey L. Wruck, Gregory A. Williby, John E. Greivenkamp

Research output: Contribution to journalArticlepeer-review

1 Scopus citations

Abstract

The four important polishing metrics: the uniformity of polishing; the rate material removal; surface microroughness; and subsurface damage; are investigated. It is found that for 25-mm-diam fused silica samples, the average peak-to-valley nonuniformity is of order of 0.1 μm/day, and the removal rate is 1.4 μm/day. The typical surface roughness is 3.5 nm after 3 days, and the subsurface damage is removed in about 3.5 days.

Original languageEnglish (US)
Pages (from-to)2089-2092
Number of pages4
JournalOptical Engineering
Volume38
Issue number12
DOIs
StatePublished - Dec 1 1999

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics
  • Engineering(all)

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