Role of ammonia and carbonates in scavenging hydroxyl radicals generated during megasonic irradiation of wafer cleaning solutions

Rajesh Balachandran, Mingrui Zhao, Bingfeng Dong, Ian Brown, Srini Raghavan, Manish K Keswani

Research output: Contribution to journalArticle

4 Citations (Scopus)

Abstract

Chemical formulations used for megasonic cleaning typically contain hydroxides, peroxides, carbonates, and others which can affect particle removal efficiency and feature damage. The current study is focused on investigating the role of carbonates in modulating the oxidation power of megasonic irradiated alkaline solutions through the scavenging of hydroxyl radicals as determined by fluorescence spectroscopy. Although studies exist in literature that report the scavenging of OH by carbonates, these studies have been conducted for waste water treatment applications using advanced oxidation processes. This work focuses on understanding the role of alkaline chemical formulations containing varying levels of carbonates and bicarbonates and solution temperatures on net generation of hydroxyl radicals for applications in semiconductor industry. Investigations were carried out at an acoustic frequency of ∼1 MHz and different power densities (2, 4 and 8 W/cm2).

Original languageEnglish (US)
Pages (from-to)82-86
Number of pages5
JournalMicroelectronic Engineering
Volume130
DOIs
StatePublished - Nov 25 2014

Fingerprint

Carbonates
Scavenging
scavenging
hydroxyl radicals
Ammonia
Hydroxyl Radical
cleaning
ammonia
Cleaning
carbonates
Irradiation
wafers
irradiation
Hydroxides
Oxidation
Peroxides
Fluorescence spectroscopy
formulations
Bicarbonates
waste water

Keywords

  • Ammonia
  • Carbonates
  • Hydroxyl radical
  • Megasonic cleaning
  • Scavenging

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials
  • Surfaces, Coatings and Films
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics

Cite this

Role of ammonia and carbonates in scavenging hydroxyl radicals generated during megasonic irradiation of wafer cleaning solutions. / Balachandran, Rajesh; Zhao, Mingrui; Dong, Bingfeng; Brown, Ian; Raghavan, Srini; Keswani, Manish K.

In: Microelectronic Engineering, Vol. 130, 25.11.2014, p. 82-86.

Research output: Contribution to journalArticle

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