Sanitization: Design of high-purity water plants: fundamental interactions in removal of organic contamination

R. A. Governal, Farhang Shadman

Research output: Contribution to journalArticle

1 Citation (Scopus)

Abstract

Modern high-purity water plants, e.g. in the semiconductor industry, consist of primary purification followed by a polishing loop incorporating a variety of purification stages and techniques. The importance of a systems approach to understanding the competing effects of these processes and the optimization of contaminant control is discussed. Experiments have been performed to investigate the interaction between filtration, UV sterilization, ozone, and ion exchange and the effects on total organics removal (TOC). A simulation model developed from this data can be used in the design and optimization of large systems. (J.M.M.)

Original languageEnglish (US)
Pages (from-to)36-37+39
JournalUltrapure Water
Volume9
Issue number6
StatePublished - 1992
Externally publishedYes

Fingerprint

Purification
purification
Contamination
semiconductor industry
Water
Ozone
Polishing
ion exchange
Ion exchange
ozone
Impurities
Semiconductor materials
water
pollutant
simulation
Industry
experiment
Experiments
contamination
effect

ASJC Scopus subject areas

  • Fluid Flow and Transfer Processes
  • Water Science and Technology

Cite this

Sanitization : Design of high-purity water plants: fundamental interactions in removal of organic contamination. / Governal, R. A.; Shadman, Farhang.

In: Ultrapure Water, Vol. 9, No. 6, 1992, p. 36-37+39.

Research output: Contribution to journalArticle

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