Scalable approach for continuous-wave deep-ultraviolet laser at 213nm

Yushi Kaneda, Tsuyoshi Tago, Toshiaki Sasa, Masahiro Sasaura, Hiroaki Nakao, Junji Hirohashi, Yasunori Furukawa

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

We present a novel approach for generation at 213nm, corresponding to the fifth harmonic of common 1064nm laser, in pure continuous-wave mode. Starting from two infrared fiber laser sources, we demonstrated 0.45W output at 213nm.

Original languageEnglish (US)
Title of host publicationAdvanced Solid State Lasers, ASSL 2018
PublisherOSA - The Optical Society
VolumePart F121-ASSL 2018
ISBN (Electronic)9781557528209
DOIs
Publication statusPublished - Jan 1 2018
EventAdvanced Solid State Lasers, ASSL 2018 - Boston, United States
Duration: Nov 4 2018Nov 8 2018

Other

OtherAdvanced Solid State Lasers, ASSL 2018
CountryUnited States
CityBoston
Period11/4/1811/8/18

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ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Mechanics of Materials

Cite this

Kaneda, Y., Tago, T., Sasa, T., Sasaura, M., Nakao, H., Hirohashi, J., & Furukawa, Y. (2018). Scalable approach for continuous-wave deep-ultraviolet laser at 213nm. In Advanced Solid State Lasers, ASSL 2018 (Vol. Part F121-ASSL 2018). OSA - The Optical Society. https://doi.org/10.1364/ASSL.2018.ATh4A.8