Scanning probe metrology in the presence of surface charge

J. E. Griffith, E. M. Kneedler, S. Ningen, A. Berghaus, C. E. Bryson, Stanley K H Pau, E. Houge, T. Shofner

Research output: Contribution to journalArticle

1 Citation (Scopus)

Abstract

The operation of a scanning force microscope that is relatively immune to charge-induced forces while allowing the probe tip to nondestructively follow the surface topography is discussed. A servoed force-balance sensor is incorporated in the instrument. The sensor responded to forces associated with the solid surfaces and not to the forces arising from charging or contamination.

Original languageEnglish (US)
Pages (from-to)3264-3267
Number of pages4
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume18
Issue number6
DOIs
StatePublished - Nov 2000
Externally publishedYes

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Surface charge
Scanning
Sensors
Surface topography
Microscopes
Contamination

ASJC Scopus subject areas

  • Engineering(all)

Cite this

Scanning probe metrology in the presence of surface charge. / Griffith, J. E.; Kneedler, E. M.; Ningen, S.; Berghaus, A.; Bryson, C. E.; Pau, Stanley K H; Houge, E.; Shofner, T.

In: Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, Vol. 18, No. 6, 11.2000, p. 3264-3267.

Research output: Contribution to journalArticle

Griffith, JE, Kneedler, EM, Ningen, S, Berghaus, A, Bryson, CE, Pau, SKH, Houge, E & Shofner, T 2000, 'Scanning probe metrology in the presence of surface charge', Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, vol. 18, no. 6, pp. 3264-3267. https://doi.org/10.1116/1.1313586
Griffith, J. E. ; Kneedler, E. M. ; Ningen, S. ; Berghaus, A. ; Bryson, C. E. ; Pau, Stanley K H ; Houge, E. ; Shofner, T. / Scanning probe metrology in the presence of surface charge. In: Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 2000 ; Vol. 18, No. 6. pp. 3264-3267.
@article{cce66edbb7b544f1a843561c46cd91cb,
title = "Scanning probe metrology in the presence of surface charge",
abstract = "The operation of a scanning force microscope that is relatively immune to charge-induced forces while allowing the probe tip to nondestructively follow the surface topography is discussed. A servoed force-balance sensor is incorporated in the instrument. The sensor responded to forces associated with the solid surfaces and not to the forces arising from charging or contamination.",
author = "Griffith, {J. E.} and Kneedler, {E. M.} and S. Ningen and A. Berghaus and Bryson, {C. E.} and Pau, {Stanley K H} and E. Houge and T. Shofner",
year = "2000",
month = "11",
doi = "10.1116/1.1313586",
language = "English (US)",
volume = "18",
pages = "3264--3267",
journal = "Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena",
issn = "1071-1023",
publisher = "AVS Science and Technology Society",
number = "6",

}

TY - JOUR

T1 - Scanning probe metrology in the presence of surface charge

AU - Griffith, J. E.

AU - Kneedler, E. M.

AU - Ningen, S.

AU - Berghaus, A.

AU - Bryson, C. E.

AU - Pau, Stanley K H

AU - Houge, E.

AU - Shofner, T.

PY - 2000/11

Y1 - 2000/11

N2 - The operation of a scanning force microscope that is relatively immune to charge-induced forces while allowing the probe tip to nondestructively follow the surface topography is discussed. A servoed force-balance sensor is incorporated in the instrument. The sensor responded to forces associated with the solid surfaces and not to the forces arising from charging or contamination.

AB - The operation of a scanning force microscope that is relatively immune to charge-induced forces while allowing the probe tip to nondestructively follow the surface topography is discussed. A servoed force-balance sensor is incorporated in the instrument. The sensor responded to forces associated with the solid surfaces and not to the forces arising from charging or contamination.

UR - http://www.scopus.com/inward/record.url?scp=0034315158&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0034315158&partnerID=8YFLogxK

U2 - 10.1116/1.1313586

DO - 10.1116/1.1313586

M3 - Article

AN - SCOPUS:0034315158

VL - 18

SP - 3264

EP - 3267

JO - Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena

JF - Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena

SN - 1071-1023

IS - 6

ER -