Scattering and coherence in EUVL

Thomas D Milster, Neil A. Beaudry

Research output: Chapter in Book/Report/Conference proceedingConference contribution

5 Citations (Scopus)

Abstract

We illustrate the importance of considering scattering from the illuminator in extreme ultraviolet lithography (EUVL) systems. Our results indicate that a significant mount of amplitude modulation noise is present in the aerial image if scatter is present in a Köhler illuminator. The effect depends on the spatial frequency of the pattern on the mask, the numerical aperture of the projection camera, the coherence factor, and placement of the plane in the illuminator where the scattering occurs.

Original languageEnglish (US)
Title of host publicationProceedings of SPIE - The International Society for Optical Engineering
EditorsY Vladimirsky
Pages537-543
Number of pages7
Volume3331
DOIs
StatePublished - 1998
EventEmerging Lithographic Technologies II - Santa Clara, CA, United States
Duration: Feb 23 1998Feb 25 1998

Other

OtherEmerging Lithographic Technologies II
CountryUnited States
CitySanta Clara, CA
Period2/23/982/25/98

Fingerprint

illuminators
Extreme ultraviolet lithography
lithography
Scattering
Amplitude modulation
scattering
Masks
Cameras
numerical aperture
Antennas
masks
projection
cameras

Keywords

  • Coherence
  • Extreme ultraviolet lithography
  • Scattering

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Condensed Matter Physics

Cite this

Milster, T. D., & Beaudry, N. A. (1998). Scattering and coherence in EUVL. In Y. Vladimirsky (Ed.), Proceedings of SPIE - The International Society for Optical Engineering (Vol. 3331, pp. 537-543) https://doi.org/10.1117/12.309613

Scattering and coherence in EUVL. / Milster, Thomas D; Beaudry, Neil A.

Proceedings of SPIE - The International Society for Optical Engineering. ed. / Y Vladimirsky. Vol. 3331 1998. p. 537-543.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Milster, TD & Beaudry, NA 1998, Scattering and coherence in EUVL. in Y Vladimirsky (ed.), Proceedings of SPIE - The International Society for Optical Engineering. vol. 3331, pp. 537-543, Emerging Lithographic Technologies II, Santa Clara, CA, United States, 2/23/98. https://doi.org/10.1117/12.309613
Milster TD, Beaudry NA. Scattering and coherence in EUVL. In Vladimirsky Y, editor, Proceedings of SPIE - The International Society for Optical Engineering. Vol. 3331. 1998. p. 537-543 https://doi.org/10.1117/12.309613
Milster, Thomas D ; Beaudry, Neil A. / Scattering and coherence in EUVL. Proceedings of SPIE - The International Society for Optical Engineering. editor / Y Vladimirsky. Vol. 3331 1998. pp. 537-543
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