Scattering and coherence in EUVL

Tom D. Milster, Neil A. Beaudry

Research output: Contribution to journalConference article

5 Scopus citations

Abstract

We illustrate the importance of considering scattering from the illuminator in extreme ultraviolet lithography (EUVL) systems. Our results indicate that a significant mount of amplitude modulation noise is present in the aerial image if scatter is present in a Köhler illuminator. The effect depends on the spatial frequency of the pattern on the mask, the numerical aperture of the projection camera, the coherence factor, and placement of the plane in the illuminator where the scattering occurs.

Original languageEnglish (US)
Pages (from-to)537-543
Number of pages7
JournalProceedings of SPIE - The International Society for Optical Engineering
Volume3331
DOIs
StatePublished - Dec 1 1998
EventEmerging Lithographic Technologies II - Santa Clara, CA, United States
Duration: Feb 23 1998Feb 25 1998

Keywords

  • Coherence
  • Extreme ultraviolet lithography
  • Scattering

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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