Sensitivity analysis and optimization method for the fabrication of one-dimensional beam-splitting phase gratings

Shaun Pacheco, Jonathan F. Brand, Melissa Zaverton, Thomas D Milster, Rongguang Liang

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

A method to design one-dimensional beam-spitting phase gratings with low sensitivity to fabrication errors is described. The method optimizes the phase function of a grating by minimizing the integrated variance of the energy of each output beam over a range of fabrication errors. Numerical results for three 1x9 beam splitting phase gratings are given. Two optimized gratings with low sensitivity to fabrication errors were compared with a grating designed for optimal efficiency. These three gratings were fabricated using gray-scale photolithography. The standard deviation of the 9 outgoing beam energies in the optimized gratings were 2.3 and 3.4 times lower than the optimal efficiency grating.

Original languageEnglish (US)
Pages (from-to)11771-11782
Number of pages12
JournalOptics Express
Volume23
Issue number9
DOIs
StatePublished - May 4 2015

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sensitivity analysis
gratings
fabrication
optimization
gray scale
sensitivity
photolithography
standard deviation
energy
output

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics

Cite this

Sensitivity analysis and optimization method for the fabrication of one-dimensional beam-splitting phase gratings. / Pacheco, Shaun; Brand, Jonathan F.; Zaverton, Melissa; Milster, Thomas D; Liang, Rongguang.

In: Optics Express, Vol. 23, No. 9, 04.05.2015, p. 11771-11782.

Research output: Contribution to journalArticle

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