Shape engineering: A novel optical proximity correction technique for attenuated phase-shift mask

S. Pau, K. Bolan, M. Blakey, O. Nalamasu

Research output: Contribution to journalConference article

Abstract

The minimization of sidelobe printability and maximization of latitude and resolution in attenuated phase shift masks (APSM) was studied theoretically and experimentally. The modification of shapes and relative orientations in contact windows was also presented. The results showed the obtaining of sidelobe suppression with no loss in process latitude and resolution.

Original languageEnglish (US)
Pages (from-to)2896-2899
Number of pages4
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume18
Issue number6
DOIs
StatePublished - Nov 1 2000
Externally publishedYes
Event44th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication - Rancho Mirage, CA, USA
Duration: May 30 2000Jun 2 2000

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Electrical and Electronic Engineering

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