Silicon dioxide as a high temperature stabilizer for silver films

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Abstract

Silver films cannot at present be used as high temperature reflectors because of severe agglomeration in the presence of oxygen at temperatures in excess of 200 °C. Cr2O3, Al2O3, SiO3 and CrOx were tested for their effectiveness as thin barrier layers, and SiO2 is the best of those tested. The use of SiO2 allows the process of hole healing to compete with the normal hole growth process. Hole healing does not last indefinitely but is superseded by a slower rate hole growth process with an activation energy of 49 kcal mol-1. Because of this last mechanism, stabilized silver is less than 1% transmitting after 50 h at 650 °C in air, whereas bare silver agglomerates to 66% transmittance after only 3 min under the same conditions. Therefore 500 Å SiO2 films can be used as long term stabilizers for silver films in oxygen atmospheres with temperatures of up to 650 °C.

Original languageEnglish (US)
Pages (from-to)159-168
Number of pages10
JournalThin Solid Films
Volume45
Issue number1
DOIs
StatePublished - Aug 15 1977

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ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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