We fabricate and characterize waveguides composed of closely spaced and longitudinally oriented silicon ridges etched into silicon-oninsulator wafers. Through both guided mode and bulk measurements, we demonstrate that the patterning of silicon waveguides on such a deeply subwavelength scale is desirable for nonlinear and sensing applications alike. The proposed waveguide geometry simultaneously exhibits comparable propagation losses to similar schemes proposed in literature, an enhanced effective third-order nonlinear susceptibility, and high sensitivity to perturbations in its environment.
ASJC Scopus subject areas
- Atomic and Molecular Physics, and Optics