Silicon nanoridge array waveguides for nonlinear and sensing applications

Matthew W. Puckett, Rajat Sharma, Felipe Vallini, Shiva Shahin, Faraz Monifi, Peter N. Barrina, Soroush Mehravar, Khanh Q Kieu, Yeshaiahu Fainman

Research output: Contribution to journalArticle

3 Citations (Scopus)

Abstract

We fabricate and characterize waveguides composed of closely spaced and longitudinally oriented silicon ridges etched into silicon-oninsulator wafers. Through both guided mode and bulk measurements, we demonstrate that the patterning of silicon waveguides on such a deeply subwavelength scale is desirable for nonlinear and sensing applications alike. The proposed waveguide geometry simultaneously exhibits comparable propagation losses to similar schemes proposed in literature, an enhanced effective third-order nonlinear susceptibility, and high sensitivity to perturbations in its environment.

Original languageEnglish (US)
Pages (from-to)28224-28233
Number of pages10
JournalOptics Express
Volume23
Issue number22
DOIs
StatePublished - Nov 2 2015

Fingerprint

waveguides
silicon
ridges
wafers
magnetic permeability
perturbation
propagation
sensitivity
geometry

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics

Cite this

Puckett, M. W., Sharma, R., Vallini, F., Shahin, S., Monifi, F., Barrina, P. N., ... Fainman, Y. (2015). Silicon nanoridge array waveguides for nonlinear and sensing applications. Optics Express, 23(22), 28224-28233. https://doi.org/10.1364/OE.23.028224

Silicon nanoridge array waveguides for nonlinear and sensing applications. / Puckett, Matthew W.; Sharma, Rajat; Vallini, Felipe; Shahin, Shiva; Monifi, Faraz; Barrina, Peter N.; Mehravar, Soroush; Kieu, Khanh Q; Fainman, Yeshaiahu.

In: Optics Express, Vol. 23, No. 22, 02.11.2015, p. 28224-28233.

Research output: Contribution to journalArticle

Puckett, MW, Sharma, R, Vallini, F, Shahin, S, Monifi, F, Barrina, PN, Mehravar, S, Kieu, KQ & Fainman, Y 2015, 'Silicon nanoridge array waveguides for nonlinear and sensing applications', Optics Express, vol. 23, no. 22, pp. 28224-28233. https://doi.org/10.1364/OE.23.028224
Puckett MW, Sharma R, Vallini F, Shahin S, Monifi F, Barrina PN et al. Silicon nanoridge array waveguides for nonlinear and sensing applications. Optics Express. 2015 Nov 2;23(22):28224-28233. https://doi.org/10.1364/OE.23.028224
Puckett, Matthew W. ; Sharma, Rajat ; Vallini, Felipe ; Shahin, Shiva ; Monifi, Faraz ; Barrina, Peter N. ; Mehravar, Soroush ; Kieu, Khanh Q ; Fainman, Yeshaiahu. / Silicon nanoridge array waveguides for nonlinear and sensing applications. In: Optics Express. 2015 ; Vol. 23, No. 22. pp. 28224-28233.
@article{fb1dd50f985a4c829cfabde1f69d13aa,
title = "Silicon nanoridge array waveguides for nonlinear and sensing applications",
abstract = "We fabricate and characterize waveguides composed of closely spaced and longitudinally oriented silicon ridges etched into silicon-oninsulator wafers. Through both guided mode and bulk measurements, we demonstrate that the patterning of silicon waveguides on such a deeply subwavelength scale is desirable for nonlinear and sensing applications alike. The proposed waveguide geometry simultaneously exhibits comparable propagation losses to similar schemes proposed in literature, an enhanced effective third-order nonlinear susceptibility, and high sensitivity to perturbations in its environment.",
author = "Puckett, {Matthew W.} and Rajat Sharma and Felipe Vallini and Shiva Shahin and Faraz Monifi and Barrina, {Peter N.} and Soroush Mehravar and Kieu, {Khanh Q} and Yeshaiahu Fainman",
year = "2015",
month = "11",
day = "2",
doi = "10.1364/OE.23.028224",
language = "English (US)",
volume = "23",
pages = "28224--28233",
journal = "Optics Express",
issn = "1094-4087",
publisher = "The Optical Society",
number = "22",

}

TY - JOUR

T1 - Silicon nanoridge array waveguides for nonlinear and sensing applications

AU - Puckett, Matthew W.

AU - Sharma, Rajat

AU - Vallini, Felipe

AU - Shahin, Shiva

AU - Monifi, Faraz

AU - Barrina, Peter N.

AU - Mehravar, Soroush

AU - Kieu, Khanh Q

AU - Fainman, Yeshaiahu

PY - 2015/11/2

Y1 - 2015/11/2

N2 - We fabricate and characterize waveguides composed of closely spaced and longitudinally oriented silicon ridges etched into silicon-oninsulator wafers. Through both guided mode and bulk measurements, we demonstrate that the patterning of silicon waveguides on such a deeply subwavelength scale is desirable for nonlinear and sensing applications alike. The proposed waveguide geometry simultaneously exhibits comparable propagation losses to similar schemes proposed in literature, an enhanced effective third-order nonlinear susceptibility, and high sensitivity to perturbations in its environment.

AB - We fabricate and characterize waveguides composed of closely spaced and longitudinally oriented silicon ridges etched into silicon-oninsulator wafers. Through both guided mode and bulk measurements, we demonstrate that the patterning of silicon waveguides on such a deeply subwavelength scale is desirable for nonlinear and sensing applications alike. The proposed waveguide geometry simultaneously exhibits comparable propagation losses to similar schemes proposed in literature, an enhanced effective third-order nonlinear susceptibility, and high sensitivity to perturbations in its environment.

UR - http://www.scopus.com/inward/record.url?scp=84957899976&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84957899976&partnerID=8YFLogxK

U2 - 10.1364/OE.23.028224

DO - 10.1364/OE.23.028224

M3 - Article

VL - 23

SP - 28224

EP - 28233

JO - Optics Express

JF - Optics Express

SN - 1094-4087

IS - 22

ER -