TY - JOUR

T1 - Skew aberration

T2 - A form of polarization aberration

AU - Yun, Garam

AU - Crabtree, Karlton

AU - Chipman, Russell A.

PY - 2011/10/15

Y1 - 2011/10/15

N2 - We define a new class of aberration, skew aberration, which is a component of polarization aberration. Skew aberration is an intrinsic rotation of polarization states due to the geometric transformation of local coordinates, independent of coatings and interface polarization. Skew aberration in a radially symmetric system has the form of a circular retardance tilt plus coma aberration. Skew aberration causes undesired polarization distribution in the exit pupil. We demonstrate statistics on skew aberration of 2383 optical systems described in Code V's U.S. patent library [Code V Version 10.3 (Synopsys, 2011), pp. 22-24]; the mean skew aberration is 0:89° and the standard deviation is 1:37°. The maximum skew aberration found is 17:45° and the minimum is -11:33°. U.S. patent 2,896,506, which has-7:01° of skew aberration, is analyzed in detail. Skew aberration should be of concern in microlithography optics and other high NA and large field of view optical systems.

AB - We define a new class of aberration, skew aberration, which is a component of polarization aberration. Skew aberration is an intrinsic rotation of polarization states due to the geometric transformation of local coordinates, independent of coatings and interface polarization. Skew aberration in a radially symmetric system has the form of a circular retardance tilt plus coma aberration. Skew aberration causes undesired polarization distribution in the exit pupil. We demonstrate statistics on skew aberration of 2383 optical systems described in Code V's U.S. patent library [Code V Version 10.3 (Synopsys, 2011), pp. 22-24]; the mean skew aberration is 0:89° and the standard deviation is 1:37°. The maximum skew aberration found is 17:45° and the minimum is -11:33°. U.S. patent 2,896,506, which has-7:01° of skew aberration, is analyzed in detail. Skew aberration should be of concern in microlithography optics and other high NA and large field of view optical systems.

UR - http://www.scopus.com/inward/record.url?scp=80054737683&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=80054737683&partnerID=8YFLogxK

U2 - 10.1364/OL.36.004062

DO - 10.1364/OL.36.004062

M3 - Article

C2 - 22002386

AN - SCOPUS:80054737683

VL - 36

SP - 4062

EP - 4064

JO - Optics Letters

JF - Optics Letters

SN - 0146-9592

IS - 20

ER -