TY - JOUR
T1 - Skew aberration
T2 - A form of polarization aberration
AU - Yun, Garam
AU - Crabtree, Karlton
AU - Chipman, Russell A.
PY - 2011/10/15
Y1 - 2011/10/15
N2 - We define a new class of aberration, skew aberration, which is a component of polarization aberration. Skew aberration is an intrinsic rotation of polarization states due to the geometric transformation of local coordinates, independent of coatings and interface polarization. Skew aberration in a radially symmetric system has the form of a circular retardance tilt plus coma aberration. Skew aberration causes undesired polarization distribution in the exit pupil. We demonstrate statistics on skew aberration of 2383 optical systems described in Code V's U.S. patent library [Code V Version 10.3 (Synopsys, 2011), pp. 22-24]; the mean skew aberration is 0:89° and the standard deviation is 1:37°. The maximum skew aberration found is 17:45° and the minimum is -11:33°. U.S. patent 2,896,506, which has-7:01° of skew aberration, is analyzed in detail. Skew aberration should be of concern in microlithography optics and other high NA and large field of view optical systems.
AB - We define a new class of aberration, skew aberration, which is a component of polarization aberration. Skew aberration is an intrinsic rotation of polarization states due to the geometric transformation of local coordinates, independent of coatings and interface polarization. Skew aberration in a radially symmetric system has the form of a circular retardance tilt plus coma aberration. Skew aberration causes undesired polarization distribution in the exit pupil. We demonstrate statistics on skew aberration of 2383 optical systems described in Code V's U.S. patent library [Code V Version 10.3 (Synopsys, 2011), pp. 22-24]; the mean skew aberration is 0:89° and the standard deviation is 1:37°. The maximum skew aberration found is 17:45° and the minimum is -11:33°. U.S. patent 2,896,506, which has-7:01° of skew aberration, is analyzed in detail. Skew aberration should be of concern in microlithography optics and other high NA and large field of view optical systems.
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U2 - 10.1364/OL.36.004062
DO - 10.1364/OL.36.004062
M3 - Article
C2 - 22002386
AN - SCOPUS:80054737683
VL - 36
SP - 4062
EP - 4064
JO - Optics Letters
JF - Optics Letters
SN - 0146-9592
IS - 20
ER -