Sol-gel hybrid glass diffractive elements by direct electron-beam exposure

J. T. Rantala, N. Nordman, O. Nordman, J. Vähäkangas, S. Honkanen, N. Peyghambarian

Research output: Contribution to journalArticle

29 Scopus citations

Abstract

The authors propose and demonstrate direct electron-beam writing of surface relief diffractive elements into hybrid inorganic/ organic sol-gel glass films. The etch depth and phase delay can be controlled by the electron dose. The potential applications include multi-phase-level diffractive elements and apodised planar waveguide gratings.

Original languageEnglish (US)
Pages (from-to)455-456
Number of pages2
JournalElectronics Letters
Volume34
Issue number5
DOIs
StatePublished - Mar 5 1998

ASJC Scopus subject areas

  • Electrical and Electronic Engineering

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    Rantala, J. T., Nordman, N., Nordman, O., Vähäkangas, J., Honkanen, S., & Peyghambarian, N. (1998). Sol-gel hybrid glass diffractive elements by direct electron-beam exposure. Electronics Letters, 34(5), 455-456. https://doi.org/10.1049/el:19980368