Spot distribution measurement using a scanning nanoslit

Anoop George, Thomas D Milster

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

A scanning and rotating nanoslit is used to measure submicrometer features in focused spot distributions. Using a filtered backprojection technique, a highly accurate reconstruction is demonstrated. Experimental results are confirmed by simulating the scanning slit technique using a physical optics simulation program. Analysis of various error mechanisms is reported, and the reconstruction algorithm is determined to be very resilient. The slit is 125nm wide and 50 μm long and is fabricated on a 120nm thick layer of aluminum. The size of the image field is 15 μm, and simulations indicate that 200nm Rayleigh resolution is possible with an infinitely narrow slit.

Original languageEnglish (US)
Pages (from-to)4746-4754
Number of pages9
JournalApplied Optics
Volume50
Issue number24
DOIs
StatePublished - Aug 20 2011

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slits
Scanning
Physical optics
scanning
physical optics
Aluminum
simulation
aluminum

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics

Cite this

Spot distribution measurement using a scanning nanoslit. / George, Anoop; Milster, Thomas D.

In: Applied Optics, Vol. 50, No. 24, 20.08.2011, p. 4746-4754.

Research output: Contribution to journalArticle

George, Anoop ; Milster, Thomas D. / Spot distribution measurement using a scanning nanoslit. In: Applied Optics. 2011 ; Vol. 50, No. 24. pp. 4746-4754.
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