Abstract
Epitaxial films of silver are grown by sputtering on mica substrates at elevated temperature. A systematic study of samples grown on different substrates and at different temperatures is carried out using X‐ray diffraction (θ–2θ and Laue). Both the temperature and substrate play crucial roles for the growth of epitaxial films. The growth of epitaxial Ni on Ag single crystal by sputtering is also reported.
| Original language | English (US) |
|---|---|
| Pages (from-to) | 23-29 |
| Number of pages | 7 |
| Journal | physica status solidi (a) |
| Volume | 73 |
| Issue number | 1 |
| DOIs | |
| State | Published - Sep 16 1982 |
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Condensed Matter Physics
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Cite this
Khan, M. R., Schuller, I. K., & Falco, C. M. (1982). Sputter Epitaxy of Ag and Ni Films. physica status solidi (a), 73(1), 23-29. https://doi.org/10.1002/pssa.2210730103