Sputter Epitaxy of Ag and Ni Films

M. R. Khan; I. K. Schuller; Ch M. Falco

doi:10.1002/pssa.2210730103

Sputter Epitaxy of Ag and Ni Films

M. R. Khan, I. K. Schuller, Ch M. Falco

Optical Sciences, College of

Research output: Contribution to journal › Article › peer-review

6 Scopus citations

Abstract

Epitaxial films of silver are grown by sputtering on mica substrates at elevated temperature. A systematic study of samples grown on different substrates and at different temperatures is carried out using X‐ray diffraction (θ–2θ and Laue). Both the temperature and substrate play crucial roles for the growth of epitaxial films. The growth of epitaxial Ni on Ag single crystal by sputtering is also reported.

Original language	English (US)
Pages (from-to)	23-29
Number of pages	7
Journal	physica status solidi (a)
Volume	73
Issue number	1
DOIs	https://doi.org/10.1002/pssa.2210730103
State	Published - Sep 16 1982

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Condensed Matter Physics

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abstract = "Epitaxial films of silver are grown by sputtering on mica substrates at elevated temperature. A systematic study of samples grown on different substrates and at different temperatures is carried out using X‐ray diffraction (θ–2θ and Laue). Both the temperature and substrate play crucial roles for the growth of epitaxial films. The growth of epitaxial Ni on Ag single crystal by sputtering is also reported.",

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