Strehl ratio for optical systems with ultrafast illumination

Weichuan Gao, Thomas D Milster

Research output: Contribution to journalArticle

1 Citation (Scopus)

Abstract

We study ultrafast laser pulse properties as they propagate through optical systems. A modified definition of Strehl ratio is used to quantify the chromatic and temporal behavior of ultrafast laser pulses at the optical focus. We propose this parameter as a figure of merit for the design and analysis of optical systems with ultrafast illumination. A simple method to obtain approximate numerical solutions is given with the help of ray tracing software. Effects of monochromatic aberrations and material dispersion up to the second order are discussed.

Original languageEnglish (US)
Pages (from-to)18028-18042
Number of pages15
JournalOptics Express
Volume26
Issue number14
DOIs
StatePublished - Jul 9 2018

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illumination
pulses
ray tracing
figure of merit
lasers
aberration
computer programs

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics

Cite this

Strehl ratio for optical systems with ultrafast illumination. / Gao, Weichuan; Milster, Thomas D.

In: Optics Express, Vol. 26, No. 14, 09.07.2018, p. 18028-18042.

Research output: Contribution to journalArticle

Gao, Weichuan ; Milster, Thomas D. / Strehl ratio for optical systems with ultrafast illumination. In: Optics Express. 2018 ; Vol. 26, No. 14. pp. 18028-18042.
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