STRUCTURAL AND ELECTRONIC PROPERTIES OF ARTIFICIAL METALLIC SUPERLATTICES.

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12 Scopus citations

Abstract

Recent progress in thin film deposition techniques has motivated renewed interest in 'artificially prepared' metallic superlattices, exhibiting different physical properties than those in naturally occurring materials. This paper describes the sputtering technique used to prepare these metallic superlattices, as well as considerations affecting their purity, interfacial quality, and crystallographic orientation. The contribution of the interfaces to the electronic transport properties is described in terms of finite size effect theories.

Original languageEnglish (US)
Title of host publicationJournal de Physique (Paris), Colloque
Pages499-507
Number of pages9
Edition4
DOIs
StatePublished - 1984

Publication series

NameJournal de Physique (Paris), Colloque
Number4
Volume45
ISSN (Print)0449-1947

ASJC Scopus subject areas

  • Engineering(all)

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  • Cite this

    Falco, C. M. (1984). STRUCTURAL AND ELECTRONIC PROPERTIES OF ARTIFICIAL METALLIC SUPERLATTICES. In Journal de Physique (Paris), Colloque (4 ed., pp. 499-507). (Journal de Physique (Paris), Colloque; Vol. 45, No. 4). https://doi.org/10.1051/jphyscol:1984574