Study of Low-k Film Functionalization and Pore Sealing Using Chlorosilanes Dissolved in Supercritical Carbon Dioxide

Eduardo Vyhmeister, Lorenzo Reyes-Bozo, Roman Rodríguez-Maecker, Anthony J Muscat, David Suleiman, L. Antonio Estévez

Research output: Contribution to journalArticle

2 Scopus citations

Abstract

Surface functionalization of hydrolyzed methyl-silsesquioxane films were performed by treatment of samples with trimethylchlorosilane (TMCS) and methyltrichlorosilane (MTCS) dissolved in supercritical carbon dioxide. Films thicknesses modifications, pore size distributions, hydrophobicity, dielectric constants, and chemical reaction analyses were performed by ellipsometry, ellipsometric porosimetry, goniometry, electrical measurements, and Fourier transform infrared spectroscopy, respectively. As results, the properties of the functionalized films were able to be modified in function of reaction conditions (concentration, temperature, and/or pressure). Layers thicker than a monolayer were deposited by both TMCS and MTCS, and a tradeoff between the surface functionalization and layer thickness for both chemicals was observed. The results led to the conclusion that a combination of reagents or processing steps could be used for surface properties tuning.

Original languageEnglish (US)
Pages (from-to)880-889
Number of pages10
JournalChemical Engineering Communications
Volume203
Issue number7
DOIs
StatePublished - Jul 2 2016

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Keywords

  • Carbon Dioxide
  • Heterogeneous reaction
  • Methyltrichlorosilane
  • Silylation
  • Supercritical fluid
  • Trimethylchlorosilane

ASJC Scopus subject areas

  • Chemical Engineering(all)
  • Chemistry(all)

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