Study of low-K film repair and pore sealing using chlorosilanes dissolved in supercritical carbon dioxide

Eduardo Vyhmeister, Lischen Choate, David Suleiman, L. Antonio Estévez, Anthony Muscat

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Original languageEnglish (US)
Title of host publication2007 AIChE Annual Meeting
StatePublished - Dec 1 2007
Event2007 AIChE Annual Meeting - Salt Lake City, UT, United States
Duration: Nov 4 2007Nov 9 2007

Publication series

NameAIChE Annual Meeting, Conference Proceedings

Other

Other2007 AIChE Annual Meeting
CountryUnited States
CitySalt Lake City, UT
Period11/4/0711/9/07

ASJC Scopus subject areas

  • Chemical Engineering(all)
  • Chemistry(all)

Cite this

Vyhmeister, E., Choate, L., Suleiman, D., Estévez, L. A., & Muscat, A. (2007). Study of low-K film repair and pore sealing using chlorosilanes dissolved in supercritical carbon dioxide. In 2007 AIChE Annual Meeting (AIChE Annual Meeting, Conference Proceedings).