Study of the micro-structure of PtxSi ultra-thin film

Liu Shuang, Charles M Falco, Zhiyong Zhong

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Ultra-thin platinum (Pt) films were deposited on Si(100) substrates at 160°C by magnetron sputtering and subsequently annealed to form silicides. The thickness of the PtxSi films was found to be approximately 4 nm as determined by transmission electron microscopy (TEM). X-ray photoelectron spectroscopy (XPS) analysis shows that these films consist of PtSi and Pt 2Si phases, and a multi-layer configuration of SiO x/PtSi/Pt2 Si/Si was detected by angle-resolved XPS. However, the Pt3Si phase was not detected by X-ray diffraction (XRD).

Original languageEnglish (US)
Pages (from-to)2925-2929
Number of pages5
JournalInternational Journal of Modern Physics B
Issue number21
Publication statusPublished - Aug 20 2011



  • binding energy
  • multilayers, transmission electron microscopy (TEM)
  • Platinum
  • sputtering
  • X-ray photoelectron spectroscopy (XPS)

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Statistical and Nonlinear Physics

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