Ultra-thin platinum (Pt) films were deposited on Si(100) substrates at 160°C by magnetron sputtering and subsequently annealed to form silicides. The thickness of the PtxSi films was found to be approximately 4 nm as determined by transmission electron microscopy (TEM). X-ray photoelectron spectroscopy (XPS) analysis shows that these films consist of PtSi and Pt 2Si phases, and a multi-layer configuration of SiO x/PtSi/Pt2 Si/Si was detected by angle-resolved XPS. However, the Pt3Si phase was not detected by X-ray diffraction (XRD).
- X-ray photoelectron spectroscopy (XPS)
- binding energy
- multilayers, transmission electron microscopy (TEM)
ASJC Scopus subject areas
- Statistical and Nonlinear Physics
- Condensed Matter Physics