Study of the micro-structure of PtxSi ultra-thin film

Liu Shuang, Charles M Falco, Zhiyong Zhong

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

Ultra-thin platinum (Pt) films were deposited on Si(100) substrates at 160°C by magnetron sputtering and subsequently annealed to form silicides. The thickness of the PtxSi films was found to be approximately 4 nm as determined by transmission electron microscopy (TEM). X-ray photoelectron spectroscopy (XPS) analysis shows that these films consist of PtSi and Pt 2Si phases, and a multi-layer configuration of SiO x/PtSi/Pt2 Si/Si was detected by angle-resolved XPS. However, the Pt3Si phase was not detected by X-ray diffraction (XRD).

Original languageEnglish (US)
Pages (from-to)2925-2929
Number of pages5
JournalInternational Journal of Modern Physics B
Volume25
Issue number21
DOIs
StatePublished - Aug 20 2011

Fingerprint

microstructure
platinum
thin films
photoelectron spectroscopy
x rays
silicides
magnetron sputtering
transmission electron microscopy
configurations
diffraction

Keywords

  • binding energy
  • multilayers, transmission electron microscopy (TEM)
  • Platinum
  • sputtering
  • X-ray photoelectron spectroscopy (XPS)

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Statistical and Nonlinear Physics

Cite this

Study of the micro-structure of PtxSi ultra-thin film. / Shuang, Liu; Falco, Charles M; Zhong, Zhiyong.

In: International Journal of Modern Physics B, Vol. 25, No. 21, 20.08.2011, p. 2925-2929.

Research output: Contribution to journalArticle

Shuang, Liu ; Falco, Charles M ; Zhong, Zhiyong. / Study of the micro-structure of PtxSi ultra-thin film. In: International Journal of Modern Physics B. 2011 ; Vol. 25, No. 21. pp. 2925-2929.
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