Sub-wavelength printing using multiple overlapping masks

S. Pau, O. Nalamasu, R. Cirelli, J. Frackoviak, A. Timko, G. P. Watson, F. Klemens, G. Timp

Research output: Contribution to journalConference article

2 Scopus citations

Abstract

A multiple exposure technique is used to print various types of patterns with critical dimensions much smaller than the wavelength of light used for exposure. The process latitude of the exposure can be very large because it is limited by the large pattern of the individual mask and not by the critical dimension of the small feature.

Original languageEnglish (US)
Pages (from-to)119-122
Number of pages4
JournalMicroelectronic Engineering
Volume53
Issue number1
DOIs
StatePublished - Jun 2000
Externally publishedYes
Event25th International Conference on Micro- and Nano-Engineering - Rome, Italy
Duration: Sep 21 1999Sep 23 1999

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics
  • Surfaces, Coatings and Films
  • Electrical and Electronic Engineering

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  • Cite this

    Pau, S., Nalamasu, O., Cirelli, R., Frackoviak, J., Timko, A., Watson, G. P., Klemens, F., & Timp, G. (2000). Sub-wavelength printing using multiple overlapping masks. Microelectronic Engineering, 53(1), 119-122. https://doi.org/10.1016/S0167-9317(00)00277-X