Sub-wavelength printing using multiple overlapping masks

Stanley K H Pau, O. Nalamasu, R. Cirelli, J. Frackoviak, A. Timko, G. P. Watson, F. Klemens, G. Timp

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

A multiple exposure technique is used to print various types of patterns with critical dimensions much smaller than the wavelength of light used for exposure. The process latitude of the exposure can be very large because it is limited by the large pattern of the individual mask and not by the critical dimension of the small feature.

Original languageEnglish (US)
Pages (from-to)119-122
Number of pages4
JournalMicroelectronic Engineering
Volume53
Issue number1
DOIs
StatePublished - Jun 2000
Externally publishedYes

Fingerprint

printing
Printing
Masks
masks
Wavelength
wavelengths

ASJC Scopus subject areas

  • Hardware and Architecture
  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials
  • Surfaces, Coatings and Films
  • Atomic and Molecular Physics, and Optics

Cite this

Pau, S. K. H., Nalamasu, O., Cirelli, R., Frackoviak, J., Timko, A., Watson, G. P., ... Timp, G. (2000). Sub-wavelength printing using multiple overlapping masks. Microelectronic Engineering, 53(1), 119-122. https://doi.org/10.1016/S0167-9317(00)00277-X

Sub-wavelength printing using multiple overlapping masks. / Pau, Stanley K H; Nalamasu, O.; Cirelli, R.; Frackoviak, J.; Timko, A.; Watson, G. P.; Klemens, F.; Timp, G.

In: Microelectronic Engineering, Vol. 53, No. 1, 06.2000, p. 119-122.

Research output: Contribution to journalArticle

Pau, SKH, Nalamasu, O, Cirelli, R, Frackoviak, J, Timko, A, Watson, GP, Klemens, F & Timp, G 2000, 'Sub-wavelength printing using multiple overlapping masks', Microelectronic Engineering, vol. 53, no. 1, pp. 119-122. https://doi.org/10.1016/S0167-9317(00)00277-X
Pau SKH, Nalamasu O, Cirelli R, Frackoviak J, Timko A, Watson GP et al. Sub-wavelength printing using multiple overlapping masks. Microelectronic Engineering. 2000 Jun;53(1):119-122. https://doi.org/10.1016/S0167-9317(00)00277-X
Pau, Stanley K H ; Nalamasu, O. ; Cirelli, R. ; Frackoviak, J. ; Timko, A. ; Watson, G. P. ; Klemens, F. ; Timp, G. / Sub-wavelength printing using multiple overlapping masks. In: Microelectronic Engineering. 2000 ; Vol. 53, No. 1. pp. 119-122.
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