Sulfate adsorption onto and desorption from silicon dioxide films

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Scopus citations

Abstract

Sulfate ion adsorption onto and desorption from silicon dioxide surface has been investigated using a quartz crystal microbalance with dissipation monitoring (QCM-D) capability. A viscoelastic model was used to calculate adsorption/desorption amount. The sulfate ion uptake at pH 6.8 varied linearly with sulfate concentration in the range 0.01 M to 0.6 M. Based on the hydrated radius of sulfate ion, the adsorption (uptake) amount indicated multilayer adsorption. The first order rate constant for sulfate desorption with DI water is approximately 0.04 s-1 and 0.12s-1 for flow rates of 0.2 ml/min and 1.0 ml/min, respectively.

Original languageEnglish (US)
Title of host publicationECS Transactions
PublisherElectrochemical Society Inc.
Pages45-53
Number of pages9
Volume69
Edition8
ISBN (Print)9781607685395
DOIs
StatePublished - 2015
EventSymposium on Semiconductor Cleaning Science and Technology 14, SCST 2015 - 228th ECS Meeting - Phoenix, United States
Duration: Oct 11 2015Oct 15 2015

Other

OtherSymposium on Semiconductor Cleaning Science and Technology 14, SCST 2015 - 228th ECS Meeting
CountryUnited States
CityPhoenix
Period10/11/1510/15/15

ASJC Scopus subject areas

  • Engineering(all)

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    Wu, B., & Raghavan, S. (2015). Sulfate adsorption onto and desorption from silicon dioxide films. In ECS Transactions (8 ed., Vol. 69, pp. 45-53). Electrochemical Society Inc.. https://doi.org/10.1149/06908.0045ecst