SULFUR FPD FLOW OPTIMIZATION AND RESPONSE NORMALIZATION WITH A VARIABLE EXPONENTIAL FUNCTION DEVICE.

J. Gary Eckhardt, M Bonner Denton, Jarvis L. Moyers

Research output: Contribution to journalArticle

31 Citations (Scopus)

Abstract

Description of the optimum flow characteristics of the flame photometric sulfur detector to maximize both the relative sensitivity and the exponential proportionality factor ( ″n″ ). In this investigation it was found that the gas flow rates for hydrogen and nitrogen plus oxidant as well as the oxidant to fuel ratio drastically affect both the exponential proportionality factor and the relative sensitivity. Also described is a simple, inexpensive electronic device designed to monitor the output signal of a flame photometric sulfur detector. With this device it is possible to obtain a linear response with changing sulfur concentration even in cases where the photomultiplier output current is proportional to the sulfur concentration raised to a power of less than two.

Original languageEnglish (US)
Pages (from-to)133-138
Number of pages6
JournalJournal of Chromatographic Science
Volume13
Issue number3
StatePublished - Mar 1975

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Exponential functions
Sulfur
Equipment and Supplies
Oxidants
Detectors
Photomultipliers
Flow of gases
Hydrogen
Nitrogen
Gases
Flow rate

ASJC Scopus subject areas

  • Clinical Biochemistry
  • Analytical Chemistry

Cite this

SULFUR FPD FLOW OPTIMIZATION AND RESPONSE NORMALIZATION WITH A VARIABLE EXPONENTIAL FUNCTION DEVICE. / Eckhardt, J. Gary; Denton, M Bonner; Moyers, Jarvis L.

In: Journal of Chromatographic Science, Vol. 13, No. 3, 03.1975, p. 133-138.

Research output: Contribution to journalArticle

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