Surface and Colloidal Chemical Aspects of Wet Cleaning

Srini Raghavan, Manish Keswani, Nandini Venkataraman

Research output: Chapter in Book/Report/Conference proceedingChapter

1 Scopus citations

Abstract

Surface and colloidal chemicals aspects relevant to wet chemical cleaning and drying of semiconductor surfaces are reviewed. Specific areas discussed in this chapter include surface charging of metal oxide and nitride films, development of an electrical double layer, zeta potential of electrified interfaces and its effect on particulate contamination, adsorption of surfactants and metal ions on insulating surfaces, principles of surface tension gradient drying, and wetting and penetration of high aspect ratio features.

Original languageEnglish (US)
Title of host publicationHandbook of Cleaning in Semiconductor Manufacturing
Subtitle of host publicationFundamental and Applications
PublisherJohn Wiley and Sons
Pages3-37
Number of pages35
ISBN (Print)9780470625958
DOIs
StatePublished - Feb 22 2011

Keywords

  • Electrical double layer
  • High aspect ratio cleaning
  • Interfacial phenomena
  • Metal adsorption
  • Surface charging of metal oxide and nitride
  • Surface tension gradient drying
  • Wet cleaning

ASJC Scopus subject areas

  • Engineering(all)

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  • Cite this

    Raghavan, S., Keswani, M., & Venkataraman, N. (2011). Surface and Colloidal Chemical Aspects of Wet Cleaning. In Handbook of Cleaning in Semiconductor Manufacturing: Fundamental and Applications (pp. 3-37). John Wiley and Sons. https://doi.org/10.1002/9781118071748.ch1