Surface cleaning of small structures during spin rinsing of patterned substrates

Davoud Zamani, Kedar Dhane, Omid Mahdavi, Michael Anthony McBride, Jun Yan, Farhang Shadman

Research output: Contribution to journalArticle

4 Citations (Scopus)

Abstract

Cleaning and rinsing of small structures are important processes in the manufacturing of micro- and nano-electronics. The latest technology uses "single-wafer spin rinsing'' in which ultra-pure water (UPW) is introduced onto the wafer which is mounted on a rotating holder. This is a complex process and its optimization for lowering water and energy usage requires better understanding of the process fundamentals. A mathematical model is presented in this paper that uses the fundamental physical mechanisms and provides a comprehensive process simulator. The model includes fluid flow, electrostatic effects, and bulk and surface interactions. The simulator is applied to the specific case of investigating the dynamics of rinsing of patterned wafers with hafnium-based high-k micro- and nano-structures. The effects of key rinse process parameters such as water flow rate, wafer spin rate, water temperatures, wafer sizes, and trench locations in the wafer are studied. Successful incorporation of this rinsing simulator in design and control of surface preparation processes would eliminate dependence on costlier and more time-consuming external analysis techniques.

Original languageEnglish (US)
Pages (from-to)57-65
Number of pages9
JournalMicroelectronic Engineering
Volume108
DOIs
StatePublished - 2013

Fingerprint

Surface cleaning
cleaning
wafers
Water
Simulators
Substrates
simulators
Hafnium
Nanoelectronics
Microelectronics
Flow of fluids
Electrostatics
Cleaning
water temperature
hafnium
water flow
Flow rate
Mathematical models
holders
microelectronics

Keywords

  • Process model
  • Single-wafer cleaning tools
  • Wafer rinsing

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials
  • Surfaces, Coatings and Films
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics

Cite this

Surface cleaning of small structures during spin rinsing of patterned substrates. / Zamani, Davoud; Dhane, Kedar; Mahdavi, Omid; McBride, Michael Anthony; Yan, Jun; Shadman, Farhang.

In: Microelectronic Engineering, Vol. 108, 2013, p. 57-65.

Research output: Contribution to journalArticle

Zamani, Davoud ; Dhane, Kedar ; Mahdavi, Omid ; McBride, Michael Anthony ; Yan, Jun ; Shadman, Farhang. / Surface cleaning of small structures during spin rinsing of patterned substrates. In: Microelectronic Engineering. 2013 ; Vol. 108. pp. 57-65.
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