Survey of Ti-, B-, and Y-based soft x-ray-extreme ultraviolet multilayer mirrors for the 2- to 12-nm wavelength region

Claude Montcalm, Patrick A. Kearney, J. M. Slaughter, Brian T. Sullivan, M. Chaker, Henri Pépin, Charles M Falco

Research output: Contribution to journalArticle

66 Citations (Scopus)

Abstract

We have performed an experimental investigation of Ti-, B4C-, B-, and Y-based multilayer mirrors for the soft x-ray-extreme ultraviolet (XUV) wavelength region between 2.0 and 12.0 nm. Eleven different material pairs were studied: Ti/Ni, Ti/Co, Ti/Cu, Ti/W, B4C/Pd, B/Mo, Y/Pd, Y/Ag, Y/Mo, Y/Nb, and Y/C. The multilayers were sputter deposited and were characterized with a number of techniques, including low-angle x-ray diffraction and normal incidence XUV reflectometry. Among the Ti-based multilayers the best results were obtained with Ti/W, with peak reflectances up to 5.2% at 2.79 nm at 61° from normal incidence. The B4C/Pd and B/Mo multilayer mirrors had near-normal incidence (5°) peak reflectances of 11.5% at 8.46 nm and 9.4% at 6.67 nm, respectively, whereas a Y/Mo multilayer mirror had a maximum peak reflectance of 25.6% at 11.30 nm at the same angle. The factors limiting the peak reflectance of these different multilayer mirrors are discussed.

Original languageEnglish (US)
Pages (from-to)5134-5147
Number of pages14
JournalApplied Optics
Volume35
Issue number25
StatePublished - Sep 1 1996

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Multilayers
mirrors
reflectance
X rays
Wavelength
incidence
wavelengths
x rays
x ray diffraction
Mirrors
Diffraction

Keywords

  • Boron
  • Boron-carbide
  • Cobalt
  • Copper
  • Enthalpy
  • Extreme ultraviolet
  • Gibbs free energy of formation
  • Interfaces
  • Molybdenum
  • Multilayer mirrors
  • Nickel
  • Normal incidence reflectance
  • Palladium
  • Soft x ray
  • Sputtering
  • Thin films
  • Titanium
  • Tungsten
  • XUV optics
  • Yttrium

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics

Cite this

Montcalm, C., Kearney, P. A., Slaughter, J. M., Sullivan, B. T., Chaker, M., Pépin, H., & Falco, C. M. (1996). Survey of Ti-, B-, and Y-based soft x-ray-extreme ultraviolet multilayer mirrors for the 2- to 12-nm wavelength region. Applied Optics, 35(25), 5134-5147.

Survey of Ti-, B-, and Y-based soft x-ray-extreme ultraviolet multilayer mirrors for the 2- to 12-nm wavelength region. / Montcalm, Claude; Kearney, Patrick A.; Slaughter, J. M.; Sullivan, Brian T.; Chaker, M.; Pépin, Henri; Falco, Charles M.

In: Applied Optics, Vol. 35, No. 25, 01.09.1996, p. 5134-5147.

Research output: Contribution to journalArticle

Montcalm, C, Kearney, PA, Slaughter, JM, Sullivan, BT, Chaker, M, Pépin, H & Falco, CM 1996, 'Survey of Ti-, B-, and Y-based soft x-ray-extreme ultraviolet multilayer mirrors for the 2- to 12-nm wavelength region', Applied Optics, vol. 35, no. 25, pp. 5134-5147.
Montcalm C, Kearney PA, Slaughter JM, Sullivan BT, Chaker M, Pépin H et al. Survey of Ti-, B-, and Y-based soft x-ray-extreme ultraviolet multilayer mirrors for the 2- to 12-nm wavelength region. Applied Optics. 1996 Sep 1;35(25):5134-5147.
Montcalm, Claude ; Kearney, Patrick A. ; Slaughter, J. M. ; Sullivan, Brian T. ; Chaker, M. ; Pépin, Henri ; Falco, Charles M. / Survey of Ti-, B-, and Y-based soft x-ray-extreme ultraviolet multilayer mirrors for the 2- to 12-nm wavelength region. In: Applied Optics. 1996 ; Vol. 35, No. 25. pp. 5134-5147.
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abstract = "We have performed an experimental investigation of Ti-, B4C-, B-, and Y-based multilayer mirrors for the soft x-ray-extreme ultraviolet (XUV) wavelength region between 2.0 and 12.0 nm. Eleven different material pairs were studied: Ti/Ni, Ti/Co, Ti/Cu, Ti/W, B4C/Pd, B/Mo, Y/Pd, Y/Ag, Y/Mo, Y/Nb, and Y/C. The multilayers were sputter deposited and were characterized with a number of techniques, including low-angle x-ray diffraction and normal incidence XUV reflectometry. Among the Ti-based multilayers the best results were obtained with Ti/W, with peak reflectances up to 5.2{\%} at 2.79 nm at 61° from normal incidence. The B4C/Pd and B/Mo multilayer mirrors had near-normal incidence (5°) peak reflectances of 11.5{\%} at 8.46 nm and 9.4{\%} at 6.67 nm, respectively, whereas a Y/Mo multilayer mirror had a maximum peak reflectance of 25.6{\%} at 11.30 nm at the same angle. The factors limiting the peak reflectance of these different multilayer mirrors are discussed.",
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AU - Chaker, M.

AU - Pépin, Henri

AU - Falco, Charles M

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N2 - We have performed an experimental investigation of Ti-, B4C-, B-, and Y-based multilayer mirrors for the soft x-ray-extreme ultraviolet (XUV) wavelength region between 2.0 and 12.0 nm. Eleven different material pairs were studied: Ti/Ni, Ti/Co, Ti/Cu, Ti/W, B4C/Pd, B/Mo, Y/Pd, Y/Ag, Y/Mo, Y/Nb, and Y/C. The multilayers were sputter deposited and were characterized with a number of techniques, including low-angle x-ray diffraction and normal incidence XUV reflectometry. Among the Ti-based multilayers the best results were obtained with Ti/W, with peak reflectances up to 5.2% at 2.79 nm at 61° from normal incidence. The B4C/Pd and B/Mo multilayer mirrors had near-normal incidence (5°) peak reflectances of 11.5% at 8.46 nm and 9.4% at 6.67 nm, respectively, whereas a Y/Mo multilayer mirror had a maximum peak reflectance of 25.6% at 11.30 nm at the same angle. The factors limiting the peak reflectance of these different multilayer mirrors are discussed.

AB - We have performed an experimental investigation of Ti-, B4C-, B-, and Y-based multilayer mirrors for the soft x-ray-extreme ultraviolet (XUV) wavelength region between 2.0 and 12.0 nm. Eleven different material pairs were studied: Ti/Ni, Ti/Co, Ti/Cu, Ti/W, B4C/Pd, B/Mo, Y/Pd, Y/Ag, Y/Mo, Y/Nb, and Y/C. The multilayers were sputter deposited and were characterized with a number of techniques, including low-angle x-ray diffraction and normal incidence XUV reflectometry. Among the Ti-based multilayers the best results were obtained with Ti/W, with peak reflectances up to 5.2% at 2.79 nm at 61° from normal incidence. The B4C/Pd and B/Mo multilayer mirrors had near-normal incidence (5°) peak reflectances of 11.5% at 8.46 nm and 9.4% at 6.67 nm, respectively, whereas a Y/Mo multilayer mirror had a maximum peak reflectance of 25.6% at 11.30 nm at the same angle. The factors limiting the peak reflectance of these different multilayer mirrors are discussed.

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