Survey of Ti-, B-, and Y-based soft x-ray–extreme ultraviolet multilayer mirrors for the 2- to 12-nm wavelength region

Claude Montcalm, Patrick A. Kearney, J. M. Slaughter, Brian T. Sullivan, M. Chaker, Henri Pépin, Charles M. Falco

Research output: Contribution to journalArticle

72 Scopus citations

Abstract

We have performed an experimental investigation of Ti-, B4C-, B-, and Y-based multilayer mirrors for the soft x-ray–extreme ultraviolet (XUV) wavelength region between 2.0 and 12.0 nm. Eleven different material pairs were studied: Ti/Ni, Ti/Co, Ti/Cu, Ti/W, B4C/Pd, B/Mo, Y/Pd, Y/Ag, Y/Mo, Y/Nb, and Y/C. The multilayers were sputter deposited and were characterized with a number of techniques, including low-angle x-ray diffraction and normal incidence XUV reflectometry. Among the Ti-based multilayers the best results were obtained with Ti/W, with peak reflectances up to 5.2% at 2.79 nm at 61° from normal incidence. The B4C/Pd and B/Mo multilayer mirrors had near-normal incidence (5°) peak reflectances of 11.5% at 8.46 nm and 9.4% at 6.67 nm, respectively, whereas a Y/Mo multilayer mirror had a maximum peak reflectance of 25.6% at 11.30 nm at the same angle. The factors limiting the peak reflectance of these different multilayer mirrors are discussed.

Original languageEnglish (US)
Pages (from-to)5134-5147
Number of pages14
JournalApplied optics
Volume35
Issue number25
DOIs
StatePublished - Sep 1 1996

Keywords

  • Boron
  • Boron-carbide
  • Carbon
  • Cobalt
  • Copper
  • Enthalpy
  • Extreme ultraviolet
  • Gibbs free energy of formation
  • Interfaces
  • Molybdenum
  • Multilayer mirrors
  • Nickel
  • Niobium
  • Normal incidence reflectance
  • Palladium
  • Silver
  • Soft x ray
  • Sputtering
  • Thin films
  • Titanium
  • Tungsten
  • XUV optics
  • Yttrium

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics
  • Engineering (miscellaneous)
  • Electrical and Electronic Engineering

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