Synthesis and characterization of lead chevrel phase thin films for hydrodesulfurization catalysis

Irmgard M. Schewe-Miller, Kwan Felix Koo, Michael Columbia, Fan Li, Glenn L Schrader

Research output: Contribution to journalArticle

9 Citations (Scopus)

Abstract

Reactive sputtering has been used to prepare the lead Chevrel phase PbMo6S8 on several substrates. The effect of processing parameters such as H2S flow rate, Pb sputtering current, substrate temperature, and annealing temperature were found to be very important in determining sample purity. Formation of PbMo6S8 from an as-deposited material apparently occurred at significantly lower annealing temperatures (400-800°C), compared to conventional solid-state preparations (1000°C). The thin films of PbMo6S8 were active thiophene hydrodesulfurization catalysts: the absence of impurities including MoS2 could be confirmed for these materials, before and after reaction. Because the characteristic catalytic properties of the lead Chevrel phases were observed, reactive sputtering may be applicable for the preparation of other Chevrel phases on catalyst supports.

Original languageEnglish (US)
Pages (from-to)2327-2335
Number of pages9
JournalChemistry of Materials
Volume6
Issue number12
StatePublished - 1994
Externally publishedYes

Fingerprint

Hydrodesulfurization
Catalysis
Lead
Reactive sputtering
Thin films
Annealing
Thiophenes
Thiophene
Substrates
Catalyst supports
Temperature
Sputtering
Flow rate
Impurities
Catalysts
Processing

ASJC Scopus subject areas

  • Materials Chemistry
  • Materials Science(all)

Cite this

Synthesis and characterization of lead chevrel phase thin films for hydrodesulfurization catalysis. / Schewe-Miller, Irmgard M.; Koo, Kwan Felix; Columbia, Michael; Li, Fan; Schrader, Glenn L.

In: Chemistry of Materials, Vol. 6, No. 12, 1994, p. 2327-2335.

Research output: Contribution to journalArticle

Schewe-Miller, Irmgard M. ; Koo, Kwan Felix ; Columbia, Michael ; Li, Fan ; Schrader, Glenn L. / Synthesis and characterization of lead chevrel phase thin films for hydrodesulfurization catalysis. In: Chemistry of Materials. 1994 ; Vol. 6, No. 12. pp. 2327-2335.
@article{f26f69fa14814732a25e08f0deecac7f,
title = "Synthesis and characterization of lead chevrel phase thin films for hydrodesulfurization catalysis",
abstract = "Reactive sputtering has been used to prepare the lead Chevrel phase PbMo6S8 on several substrates. The effect of processing parameters such as H2S flow rate, Pb sputtering current, substrate temperature, and annealing temperature were found to be very important in determining sample purity. Formation of PbMo6S8 from an as-deposited material apparently occurred at significantly lower annealing temperatures (400-800°C), compared to conventional solid-state preparations (1000°C). The thin films of PbMo6S8 were active thiophene hydrodesulfurization catalysts: the absence of impurities including MoS2 could be confirmed for these materials, before and after reaction. Because the characteristic catalytic properties of the lead Chevrel phases were observed, reactive sputtering may be applicable for the preparation of other Chevrel phases on catalyst supports.",
author = "Schewe-Miller, {Irmgard M.} and Koo, {Kwan Felix} and Michael Columbia and Fan Li and Schrader, {Glenn L}",
year = "1994",
language = "English (US)",
volume = "6",
pages = "2327--2335",
journal = "Chemistry of Materials",
issn = "0897-4756",
publisher = "American Chemical Society",
number = "12",

}

TY - JOUR

T1 - Synthesis and characterization of lead chevrel phase thin films for hydrodesulfurization catalysis

AU - Schewe-Miller, Irmgard M.

AU - Koo, Kwan Felix

AU - Columbia, Michael

AU - Li, Fan

AU - Schrader, Glenn L

PY - 1994

Y1 - 1994

N2 - Reactive sputtering has been used to prepare the lead Chevrel phase PbMo6S8 on several substrates. The effect of processing parameters such as H2S flow rate, Pb sputtering current, substrate temperature, and annealing temperature were found to be very important in determining sample purity. Formation of PbMo6S8 from an as-deposited material apparently occurred at significantly lower annealing temperatures (400-800°C), compared to conventional solid-state preparations (1000°C). The thin films of PbMo6S8 were active thiophene hydrodesulfurization catalysts: the absence of impurities including MoS2 could be confirmed for these materials, before and after reaction. Because the characteristic catalytic properties of the lead Chevrel phases were observed, reactive sputtering may be applicable for the preparation of other Chevrel phases on catalyst supports.

AB - Reactive sputtering has been used to prepare the lead Chevrel phase PbMo6S8 on several substrates. The effect of processing parameters such as H2S flow rate, Pb sputtering current, substrate temperature, and annealing temperature were found to be very important in determining sample purity. Formation of PbMo6S8 from an as-deposited material apparently occurred at significantly lower annealing temperatures (400-800°C), compared to conventional solid-state preparations (1000°C). The thin films of PbMo6S8 were active thiophene hydrodesulfurization catalysts: the absence of impurities including MoS2 could be confirmed for these materials, before and after reaction. Because the characteristic catalytic properties of the lead Chevrel phases were observed, reactive sputtering may be applicable for the preparation of other Chevrel phases on catalyst supports.

UR - http://www.scopus.com/inward/record.url?scp=3943083313&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=3943083313&partnerID=8YFLogxK

M3 - Article

AN - SCOPUS:3943083313

VL - 6

SP - 2327

EP - 2335

JO - Chemistry of Materials

JF - Chemistry of Materials

SN - 0897-4756

IS - 12

ER -