The effects of process-induced stress on the microstructures and the phase transformation characteristics of sputtered titanium-nickel thin-film shape-memory alloys

Rong Xin Wang, Yitshak Zohar, Man Wong

Research output: Contribution to journalArticle

7 Citations (Scopus)

Abstract

The microstructures and the phase transformation temperatures of sputtered titanium-nickel (TiNi) thin films, both free-standing and attached on different underlying multi-layer substrates, have been studied. Differences in the microstructures, such as the lattice constants and relative concentrations of TiNi, Ti 2Ni and TiNi 3 phases, have been observed among the free-standing and the attached films, among the films attached on different underlying multi-layers and among the films with different relative orders of ageing and release. Not surprisingly, the corresponding phase transformation temperatures are also different. It is proposed that both process- and substrate-induced stresses affect the microstructures, hence the phase transformation characteristics, of the resulting shape-memory thin films.

Original languageEnglish (US)
Pages (from-to)686-691
Number of pages6
JournalJournal of Micromechanics and Microengineering
Volume11
Issue number6
DOIs
StatePublished - Nov 2001
Externally publishedYes

Fingerprint

shape memory alloys
Titanium
Nickel
Shape memory effect
phase transformations
titanium
Phase transitions
nickel
Thin films
microstructure
Microstructure
thin films
Substrates
Lattice constants
Aging of materials
Temperature
temperature

ASJC Scopus subject areas

  • Instrumentation
  • Materials Science(all)
  • Mechanics of Materials
  • Computational Mechanics

Cite this

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abstract = "The microstructures and the phase transformation temperatures of sputtered titanium-nickel (TiNi) thin films, both free-standing and attached on different underlying multi-layer substrates, have been studied. Differences in the microstructures, such as the lattice constants and relative concentrations of TiNi, Ti 2Ni and TiNi 3 phases, have been observed among the free-standing and the attached films, among the films attached on different underlying multi-layers and among the films with different relative orders of ageing and release. Not surprisingly, the corresponding phase transformation temperatures are also different. It is proposed that both process- and substrate-induced stresses affect the microstructures, hence the phase transformation characteristics, of the resulting shape-memory thin films.",
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AB - The microstructures and the phase transformation temperatures of sputtered titanium-nickel (TiNi) thin films, both free-standing and attached on different underlying multi-layer substrates, have been studied. Differences in the microstructures, such as the lattice constants and relative concentrations of TiNi, Ti 2Ni and TiNi 3 phases, have been observed among the free-standing and the attached films, among the films attached on different underlying multi-layers and among the films with different relative orders of ageing and release. Not surprisingly, the corresponding phase transformation temperatures are also different. It is proposed that both process- and substrate-induced stresses affect the microstructures, hence the phase transformation characteristics, of the resulting shape-memory thin films.

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