The effects of process-induced stress on the microstructures and the phase transformation characteristics of sputtered titanium-nickel thin-film shape-memory alloys

Rong Xin Wang, Yitshak Zohar, Man Wong

Research output: Contribution to journalArticle

8 Scopus citations


The microstructures and the phase transformation temperatures of sputtered titanium-nickel (TiNi) thin films, both free-standing and attached on different underlying multi-layer substrates, have been studied. Differences in the microstructures, such as the lattice constants and relative concentrations of TiNi, Ti 2Ni and TiNi 3 phases, have been observed among the free-standing and the attached films, among the films attached on different underlying multi-layers and among the films with different relative orders of ageing and release. Not surprisingly, the corresponding phase transformation temperatures are also different. It is proposed that both process- and substrate-induced stresses affect the microstructures, hence the phase transformation characteristics, of the resulting shape-memory thin films.

Original languageEnglish (US)
Pages (from-to)686-691
Number of pages6
JournalJournal of Micromechanics and Microengineering
Issue number6
StatePublished - Nov 1 2001


ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Mechanics of Materials
  • Mechanical Engineering
  • Electrical and Electronic Engineering

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