The role of copper pretreatment on the morphology of graphene grown by chemical vapor deposition

Tony J. Gnanaprakasa, Yuanxi Gu, Steven K. Eddy, Zhenxing Han, Warren J. Beck, Krishna Muralidharan, Srini Raghavan

Research output: Contribution to journalArticle

9 Scopus citations


The effect of pretreatment of copper on the ensuing morphology and surface coverage of graphene grown using chemical vapor deposition (CVD) has been investigated. Specifically, graphene grown on electropolished copper (EP-Cu) was analyzed with respect to its surface morphology, surface roughness and thickness, and compared with graphene grown on as cold-rolled acetic acid cleaned copper (AA-Cu). Results show an improvement in the quality of graphene obtained using EP-Cu over AA-Cu. Additionally, electrochemical polarization studies were performed on annealed and graphene coated EP-Cu in acidic solutions. The results indicate that corrosion inhibition of EP-Cu is possible through the use of graphene films.

Original languageEnglish (US)
Pages (from-to)1-7
Number of pages7
JournalMicroelectronic Engineering
Publication statusPublished - Jan 5 2015



  • Copper pretreatment
  • Corrosion inhibitor
  • CVD
  • Electropolishing
  • Graphene

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials
  • Surfaces, Coatings and Films
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics

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