THERMALIZATION OF SPUTTERED ATOMS.

Kevin Meyer, Ivan K. Schuller, Charles M Falco

Research output: Contribution to journalArticle

200 Citations (Scopus)

Abstract

The energy distributions of sputtered Nb and Cu atoms ejected from amorphous targets under low-energy Ar bombardment have been calculated. A formula based on elementary kinetic gas theory is used to calculate the subsequent energy loss of the ejected atoms due to collisions in the sputtering gas. The energy distributions of the sputtered atoms arriving at the substrate is compared with the distributions obtained using thermal evaporation techniques. This comparison indicates that the preparation of epitaxial metallic films, such as layered ultrathin coherent structures, using sputtering techniques may have fundamental advantages over thermal evaporation.

Original languageEnglish (US)
Pages (from-to)5803-5805
Number of pages3
JournalJournal of Applied Physics
Volume52
Issue number9
DOIs
StatePublished - Sep 1981
Externally publishedYes

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energy distribution
sputtering
evaporation
atoms
gases
bombardment
energy dissipation
preparation
collisions
kinetics
energy

ASJC Scopus subject areas

  • Physics and Astronomy(all)
  • Physics and Astronomy (miscellaneous)

Cite this

THERMALIZATION OF SPUTTERED ATOMS. / Meyer, Kevin; Schuller, Ivan K.; Falco, Charles M.

In: Journal of Applied Physics, Vol. 52, No. 9, 09.1981, p. 5803-5805.

Research output: Contribution to journalArticle

Meyer, Kevin ; Schuller, Ivan K. ; Falco, Charles M. / THERMALIZATION OF SPUTTERED ATOMS. In: Journal of Applied Physics. 1981 ; Vol. 52, No. 9. pp. 5803-5805.
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