Thermalization of sputtered atoms

Kevin Meyer, Ivan K. Schuller, Charles M. Falco

Research output: Contribution to journalArticle

200 Scopus citations

Abstract

We have calculated the energy distributions of sputtered Nb and Cu atoms ejected from amorphous targets under low-energy Ar bombardment. A formula based on elementary kinetic gas theory is used to calculate the subsequent energy loss of the ejected atoms due to collisions in the sputtering gas. The energy distributions of the sputtered atoms arriving at the substrate is compared with the distributions obtained using thermal evaporation techniques. This comparison indicates that the preparation of epitaxial metallic films, such as Layered Ultrathin Coherent Structures using sputtering techniques may have fundamental advantages over thermal evaporation.

Original languageEnglish (US)
Pages (from-to)5803-5805
Number of pages3
JournalJournal of Applied Physics
Volume52
Issue number9
DOIs
StatePublished - Dec 1 1981

ASJC Scopus subject areas

  • Physics and Astronomy(all)

Fingerprint Dive into the research topics of 'Thermalization of sputtered atoms'. Together they form a unique fingerprint.

  • Cite this