Thermographic and histological evaluation of laser skin resurfacing scans

Bernard Choi, Eric K. Chan, Jennifer K Barton, Sharon L. Thomsen, Ashley J. Welch

Research output: Contribution to journalArticle

8 Citations (Scopus)

Abstract

In general, ablative laser skin resurfacing procedures have shown good short-term efficacy. However, the mchanisms underlying laser skin resurfacing remain poorly understood. We performed a quantitative study to investigate the thermal response of skin to CO2 laser irradiation. Raster scans were performed on an in vivo rat model and radiometric surface temperatures measured using a thermal camera. Temperatures approaching 400°C were measured during the scans and remained above the initial skin temperature for durations longer than ten seconds. Analysis of histology sections showed that the epidermis remained partially intact after three passess. To explain the observed trends in the temperature response and histology, the dynamics of optical and thermal parameters were investigated. Water vaporization played a key role in governing the response of the skin to subsequent laser passes. Char formation and pulse stacking altered the thermal effects.

Original languageEnglish (US)
Pages (from-to)1116-1126
Number of pages11
JournalIEEE Journal on Selected Topics in Quantum Electronics
Volume5
Issue number4
DOIs
StatePublished - Jul 1999

Fingerprint

Skin
histology
Lasers
evaluation
Histology
lasers
epidermis
Temperature
surface temperature
rats
temperature
temperature effects
Laser beam effects
Vaporization
Thermal effects
cameras
Rats
Laser pulses
trends
irradiation

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Atomic and Molecular Physics, and Optics

Cite this

Thermographic and histological evaluation of laser skin resurfacing scans. / Choi, Bernard; Chan, Eric K.; Barton, Jennifer K; Thomsen, Sharon L.; Welch, Ashley J.

In: IEEE Journal on Selected Topics in Quantum Electronics, Vol. 5, No. 4, 07.1999, p. 1116-1126.

Research output: Contribution to journalArticle

Choi, Bernard ; Chan, Eric K. ; Barton, Jennifer K ; Thomsen, Sharon L. ; Welch, Ashley J. / Thermographic and histological evaluation of laser skin resurfacing scans. In: IEEE Journal on Selected Topics in Quantum Electronics. 1999 ; Vol. 5, No. 4. pp. 1116-1126.
@article{9b616d6b829e4d2d96472cd9ec6d5496,
title = "Thermographic and histological evaluation of laser skin resurfacing scans",
abstract = "In general, ablative laser skin resurfacing procedures have shown good short-term efficacy. However, the mchanisms underlying laser skin resurfacing remain poorly understood. We performed a quantitative study to investigate the thermal response of skin to CO2 laser irradiation. Raster scans were performed on an in vivo rat model and radiometric surface temperatures measured using a thermal camera. Temperatures approaching 400°C were measured during the scans and remained above the initial skin temperature for durations longer than ten seconds. Analysis of histology sections showed that the epidermis remained partially intact after three passess. To explain the observed trends in the temperature response and histology, the dynamics of optical and thermal parameters were investigated. Water vaporization played a key role in governing the response of the skin to subsequent laser passes. Char formation and pulse stacking altered the thermal effects.",
author = "Bernard Choi and Chan, {Eric K.} and Barton, {Jennifer K} and Thomsen, {Sharon L.} and Welch, {Ashley J.}",
year = "1999",
month = "7",
doi = "10.1109/2944.796338",
language = "English (US)",
volume = "5",
pages = "1116--1126",
journal = "IEEE Journal of Selected Topics in Quantum Electronics",
issn = "1077-260X",
publisher = "Institute of Electrical and Electronics Engineers Inc.",
number = "4",

}

TY - JOUR

T1 - Thermographic and histological evaluation of laser skin resurfacing scans

AU - Choi, Bernard

AU - Chan, Eric K.

AU - Barton, Jennifer K

AU - Thomsen, Sharon L.

AU - Welch, Ashley J.

PY - 1999/7

Y1 - 1999/7

N2 - In general, ablative laser skin resurfacing procedures have shown good short-term efficacy. However, the mchanisms underlying laser skin resurfacing remain poorly understood. We performed a quantitative study to investigate the thermal response of skin to CO2 laser irradiation. Raster scans were performed on an in vivo rat model and radiometric surface temperatures measured using a thermal camera. Temperatures approaching 400°C were measured during the scans and remained above the initial skin temperature for durations longer than ten seconds. Analysis of histology sections showed that the epidermis remained partially intact after three passess. To explain the observed trends in the temperature response and histology, the dynamics of optical and thermal parameters were investigated. Water vaporization played a key role in governing the response of the skin to subsequent laser passes. Char formation and pulse stacking altered the thermal effects.

AB - In general, ablative laser skin resurfacing procedures have shown good short-term efficacy. However, the mchanisms underlying laser skin resurfacing remain poorly understood. We performed a quantitative study to investigate the thermal response of skin to CO2 laser irradiation. Raster scans were performed on an in vivo rat model and radiometric surface temperatures measured using a thermal camera. Temperatures approaching 400°C were measured during the scans and remained above the initial skin temperature for durations longer than ten seconds. Analysis of histology sections showed that the epidermis remained partially intact after three passess. To explain the observed trends in the temperature response and histology, the dynamics of optical and thermal parameters were investigated. Water vaporization played a key role in governing the response of the skin to subsequent laser passes. Char formation and pulse stacking altered the thermal effects.

UR - http://www.scopus.com/inward/record.url?scp=0033331756&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0033331756&partnerID=8YFLogxK

U2 - 10.1109/2944.796338

DO - 10.1109/2944.796338

M3 - Article

AN - SCOPUS:0033331756

VL - 5

SP - 1116

EP - 1126

JO - IEEE Journal of Selected Topics in Quantum Electronics

JF - IEEE Journal of Selected Topics in Quantum Electronics

SN - 1077-260X

IS - 4

ER -