Thickness variation effects on X-ray scattering of multilayers

Ahmed Boufelfel, Charles M Falco

Research output: Contribution to journalArticle

1 Citation (Scopus)

Abstract

A cosine-squared flux distribution from a disk-shaped source was used to calculate the spatial deposition profiles for films sputtered onto rotating substrates. Depositions were made by a stable and reproducible d.c. sputtering machine and thicknesses measured by Rutherford backscattering spectroscopy to compare with this calculation. The measured and calculated profiles were compared at a fixed value of target-substrate distance. We showed for the first time that the thickness variation is largely responsible for the broadening of the X-ray Bragg peaks at low angles of Fe Pd multilayers. These results have important implications for the classical interpretation of X-ray scattering from multilayered structures.

Original languageEnglish (US)
Pages (from-to)26-33
Number of pages8
JournalThin Solid Films
Volume258
Issue number1-2
DOIs
StatePublished - Mar 15 1995

Fingerprint

X ray scattering
Multilayers
Rutherford backscattering spectroscopy
Substrates
profiles
scattering
Sputtering
backscattering
x rays
sputtering
Fluxes
X rays
spectroscopy

Keywords

  • Deposition process
  • Multilayers
  • X-ray scattering

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Materials Chemistry
  • Metals and Alloys
  • Surfaces, Coatings and Films
  • Surfaces and Interfaces

Cite this

Thickness variation effects on X-ray scattering of multilayers. / Boufelfel, Ahmed; Falco, Charles M.

In: Thin Solid Films, Vol. 258, No. 1-2, 15.03.1995, p. 26-33.

Research output: Contribution to journalArticle

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