Transmission of light through slit apertures in metallic films

Masud Mansuripur, Yong Xie, Armis R. Zakharian, Jerome V. Moloney

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Optical transmission through sub-wavelength slit apertures is studied based on the electromagnetic field distributions obtained in computer simulations. The results show the existence of a cutoff for E and a strong transmission (with no cutoff) for E; here and refer to the direction of the incident E-field relative to the long axis of the slit. When multiple slits are present, under certain conditions, interference among the induced surface charges and currents can result in enhanced transmission through individual slits.

Original languageEnglish (US)
Title of host publicationInternational Symposium on Optical Memory and Optical Data Storage, ISOM_ODS 2005
PublisherOptical Society of America
ISBN (Print)1557527946, 9781557527943
StatePublished - Jan 1 2005
EventInternational Symposium on Optical Memory and Optical Data Storage, ISOM_ODS 2005 - Honolulu, HI, United States
Duration: Jul 10 2005Jul 10 2005

Publication series

NameOptics InfoBase Conference Papers
ISSN (Electronic)2162-2701

Other

OtherInternational Symposium on Optical Memory and Optical Data Storage, ISOM_ODS 2005
CountryUnited States
CityHonolulu, HI
Period7/10/057/10/05

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ASJC Scopus subject areas

  • Instrumentation
  • Atomic and Molecular Physics, and Optics

Cite this

Mansuripur, M., Xie, Y., Zakharian, A. R., & Moloney, J. V. (2005). Transmission of light through slit apertures in metallic films. In International Symposium on Optical Memory and Optical Data Storage, ISOM_ODS 2005 (Optics InfoBase Conference Papers). Optical Society of America.