Treatment of chemical-mechanical planarization wastes by electrocoagulation/electro-fenton method

Kon Tsu Kin, Hong Shiang Tang, Shu Fei Chan, Srini Raghavan, Sergio Martinez

Research output: Contribution to journalArticlepeer-review

25 Scopus citations

Abstract

A method for the treatment of chemical-mechanical planaarization wastewater that utilizes the principles of electrocoagulation (EC) and electro-Fenton (EF) reactions has been investigated. The method consists of subjecting the wastewater to an applied electric field between two iron electrodes, in the presence of hydrogen peroxide. Dissolved iron is responsible for electrocoagulation, while the hydroxyl radicals produced through the reaction of dissolved iron species with hydrogen peroxide destroy dissolved organics. Over 95% of fine particles can be removed after sedimentation following exposure to electric field, and the turbidity of the clarified solution can be reduced to very low values (0.3 NTU).

Original languageEnglish (US)
Pages (from-to)208-215
Number of pages8
JournalIEEE Transactions on Semiconductor Manufacturing
Volume19
Issue number2
DOIs
StatePublished - May 2006

Keywords

  • CMP waste treatment
  • Chemical-mechanical planarization (CMP)
  • Electro-fenton
  • Electrocoagulation

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Industrial and Manufacturing Engineering
  • Electrical and Electronic Engineering

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