Tribological characterization of anionic supramolecular assemblies in post-sti-cmp cleaning solution using a novel post-cmp pva brush scrubber

Ara Philipossian, Yasa Sampurno, Sian Theng, Fransisca Sudargho, Katherine Wortman-Otto, Carolyn Graverson, Jason Keleher

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

We have shown how different micellar (SDBS) vs. polyelectrolytic (PSSA) supramolecular assemblies in post-CMP cleaning solutions differ in their tribological performance when used in a novel PVA scrubber for 300-mm silicon dioxide wafer cleaning. Significant differences in real-time shear force and coefficient of friction data from the wafer-solution-brush interface (both in time domain as well as frequency domain) have been attributed to differences in each supramolecule’s chemical functionality and structure, which in turn, have been correlated to wafer-level defects. The work has underscored the importance of measuring the tribological attributes of post-CMP cleaning processes in an effort to improve cleaning performance.

Original languageEnglish (US)
Title of host publicationUltra Clean Processing of Semiconductor Surfaces XV - Selected peer-reviewed full text papers from the 15th International Symposium on Ultra Clean Processing of Semiconductor Surfaces, UCPSS 2021
EditorsPaul W. Mertens, Kurt Wostyn, Marc Meuris, Marc Heyns
PublisherTrans Tech Publications Ltd
Pages264-269
Number of pages6
ISBN (Print)9783035738018
DOIs
StatePublished - 2021
Externally publishedYes
Event15th International Symposium on Ultra Clean Processing of Semiconductor Surfaces, UCPSS 2021 - Mechelen, Belgium
Duration: Apr 12 2021Apr 15 2021

Publication series

NameSolid State Phenomena
Volume314 SSP
ISSN (Print)1012-0394
ISSN (Electronic)1662-9779

Conference

Conference15th International Symposium on Ultra Clean Processing of Semiconductor Surfaces, UCPSS 2021
Country/TerritoryBelgium
CityMechelen
Period4/12/214/15/21

Keywords

  • Brush
  • Coefficient of friction
  • Micelle
  • PVA
  • Polyelectrolyte
  • Post-CMP cleaning
  • Scrubbing
  • Shear force
  • Supramolecular assemblies

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics
  • Materials Science(all)
  • Condensed Matter Physics

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