Tribological, thermal, and wear characteristics of poly(phenylene sulfide) and polyetheretherketone retaining rings in interlayer dielectric CMP

Xiaomin Wei, Yun Zhuang, Yasa Sampurno, Fransisca Sudargho, Christopher Wargo, Leonard Borucki, Ara Philipossian

Research output: Contribution to journalArticle

8 Scopus citations

Abstract

Retaining rings made of poly(phenylene sulfide) (PPS) and polyetheretherketone (PEEK) with two different slot designs were subjected to a 4 h wear test. During the chemical mechanical planarization (CMP) process, the PPS retaining ring induced a higher coefficient of friction (COF) by ∼0.1 than the PEEK retaining rings. In addition, the PPS retaining ring exhibited a higher wear rate than the PEEK retaining rings by ∼28%. Although the retaining ring slot design did not significantly affect the COF and wear rate, retaining rings with sharp slot edges resulted in higher pad surface abruptness.

Original languageEnglish (US)
Pages (from-to)H391-H395
JournalElectrochemical and Solid-State Letters
Volume13
Issue number11
DOIs
StatePublished - Sep 20 2010

ASJC Scopus subject areas

  • Chemical Engineering(all)
  • Materials Science(all)
  • Physical and Theoretical Chemistry
  • Electrochemistry
  • Electrical and Electronic Engineering

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