Tribological, thermal, and wear characteristics of poly(phenylene sulfide) and polyetheretherketone retaining rings in interlayer dielectric CMP

Xiaomin Wei, Yun Zhuang, Yasa Sampurno, Fransisca Sudargho, Christopher Wargo, Leonard Borucki, Ara Philipossian

Research output: Contribution to journalArticle

7 Citations (Scopus)

Abstract

Retaining rings made of poly(phenylene sulfide) (PPS) and polyetheretherketone (PEEK) with two different slot designs were subjected to a 4 h wear test. During the chemical mechanical planarization (CMP) process, the PPS retaining ring induced a higher coefficient of friction (COF) by ∼0.1 than the PEEK retaining rings. In addition, the PPS retaining ring exhibited a higher wear rate than the PEEK retaining rings by ∼28%. Although the retaining ring slot design did not significantly affect the COF and wear rate, retaining rings with sharp slot edges resulted in higher pad surface abruptness.

Original languageEnglish (US)
JournalElectrochemical and Solid-State Letters
Volume13
Issue number11
DOIs
StatePublished - 2010

Fingerprint

PEEK
Chemical mechanical polishing
Sulfides
retaining
sulfides
interlayers
Wear of materials
rings
Friction
slots
coefficient of friction
wear tests
polyetheretherketone
Hot Temperature

ASJC Scopus subject areas

  • Electrochemistry
  • Electrical and Electronic Engineering
  • Materials Science(all)
  • Chemical Engineering(all)
  • Physical and Theoretical Chemistry

Cite this

Tribological, thermal, and wear characteristics of poly(phenylene sulfide) and polyetheretherketone retaining rings in interlayer dielectric CMP. / Wei, Xiaomin; Zhuang, Yun; Sampurno, Yasa; Sudargho, Fransisca; Wargo, Christopher; Borucki, Leonard; Philipossian, Ara.

In: Electrochemical and Solid-State Letters, Vol. 13, No. 11, 2010.

Research output: Contribution to journalArticle

Wei, Xiaomin ; Zhuang, Yun ; Sampurno, Yasa ; Sudargho, Fransisca ; Wargo, Christopher ; Borucki, Leonard ; Philipossian, Ara. / Tribological, thermal, and wear characteristics of poly(phenylene sulfide) and polyetheretherketone retaining rings in interlayer dielectric CMP. In: Electrochemical and Solid-State Letters. 2010 ; Vol. 13, No. 11.
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AU - Wargo, Christopher

AU - Borucki, Leonard

AU - Philipossian, Ara

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