Understanding and controlling electrochemical effects in wet processing

S. Raghavan, C. C. Chiang

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Electrochemical techniques have long been used in understanding and improving the performance of various wet chemical processing steps such as etching, cleaning, passivation and rinsing used in integrated circuit (IC) manufacturing. The objective of this paper is to provide a few examples of how electrochemical techniques can be used to probe some important areas in wet processing. It is not intended to be an exhaustive review of techniques and problems reported in the literature.

Original languageEnglish (US)
Title of host publicationSemiconductor Cleaning Science and Technology 14, SCST 14
EditorsT. Hattori, P. W. Mertens, R. E. Novak, J. Ruzyllo
PublisherElectrochemical Society Inc.
Pages3-14
Number of pages12
Edition8
ISBN (Electronic)9781607685395
DOIs
StatePublished - 2015
EventSymposium on Semiconductor Cleaning Science and Technology 14, SCST 2015 - 228th ECS Meeting - Phoenix, United States
Duration: Oct 11 2015Oct 15 2015

Publication series

NameECS Transactions
Number8
Volume69
ISSN (Print)1938-6737
ISSN (Electronic)1938-5862

Other

OtherSymposium on Semiconductor Cleaning Science and Technology 14, SCST 2015 - 228th ECS Meeting
Country/TerritoryUnited States
CityPhoenix
Period10/11/1510/15/15

ASJC Scopus subject areas

  • Engineering(all)

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