Universal threshold for femtosecond laser ablation with oblique illumination

Xiao Long Liu, Weibo Cheng, Massimo Petrarca, Pavel G Polynkin

Research output: Contribution to journalArticle

5 Citations (Scopus)

Abstract

We quantify the dependence of the single-shot ablation threshold on the angle of incidence and polarization of a femtosecond laser beam, for three dissimilar solid-state materials: a metal, a dielectric, and a semiconductor. Using the constant, linear value of the index of refraction, we calculate the laser fluence transmitted through the air-material interface at the point of ablation threshold. We show that, in spite of the highly nonlinear ionization dynamics involved in the ablation process, the so defined transmitted threshold fluence is universally independent of the angle of incidence and polarization of the laser beam for all three material types. We suggest that angular dependence of ablation threshold can be utilized for profiling fluence distributions in ultra-intense femtosecond laser beams.

Original languageEnglish (US)
Article number161604
JournalApplied Physics Letters
Volume109
Issue number16
DOIs
StatePublished - Oct 17 2016

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laser ablation
ablation
illumination
fluence
thresholds
laser beams
incidence
polarization
shot
refraction
solid state
ionization
air
metals
lasers

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

Cite this

Universal threshold for femtosecond laser ablation with oblique illumination. / Liu, Xiao Long; Cheng, Weibo; Petrarca, Massimo; Polynkin, Pavel G.

In: Applied Physics Letters, Vol. 109, No. 16, 161604, 17.10.2016.

Research output: Contribution to journalArticle

Liu, Xiao Long ; Cheng, Weibo ; Petrarca, Massimo ; Polynkin, Pavel G. / Universal threshold for femtosecond laser ablation with oblique illumination. In: Applied Physics Letters. 2016 ; Vol. 109, No. 16.
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