Voltammetric characterization of gold, metallized-plastic electrodes, following exposure to ion beams or RF plasmas

Neal R Armstrong, J. R. White

Research output: Contribution to journalArticle

9 Citations (Scopus)

Abstract

Voltammetric analysis for the formation and reduction of gold oxide was used to probe surface compositional changes caused by argon-ion beams or oxygen RF plasmas. Gold, metallized plastic film electrodes were explored because of their reproducible surface composition and electrochemical characteristics, and because of our interest in exploiting the carbonaceous composition of their surface. Low doses of ions (<5 × 1015/cm 2) caused a physical and chemical activation of the gold film surface. Higher ion doses caused degradation of the conductive film which could be monitored electrochemically. Oxygen RF plasmas caused the formation of a voltammetrically quantitable gold oxide-in a fashion not seen for bulk gold or other gold films.

Original languageEnglish (US)
Pages (from-to)121-136
Number of pages16
JournalJournal of Electroanalytical Chemistry
Volume131
Issue numberC
DOIs
StatePublished - Jan 8 1982

Fingerprint

Gold
Ion beams
Plastics
Plasmas
Electrodes
Oxides
Ions
Oxygen
Plastic films
Conductive films
Argon
Surface structure
Chemical activation
Degradation
Chemical analysis

ASJC Scopus subject areas

  • Chemical Engineering(all)
  • Analytical Chemistry
  • Electrochemistry

Cite this

Voltammetric characterization of gold, metallized-plastic electrodes, following exposure to ion beams or RF plasmas. / Armstrong, Neal R; White, J. R.

In: Journal of Electroanalytical Chemistry, Vol. 131, No. C, 08.01.1982, p. 121-136.

Research output: Contribution to journalArticle

@article{9b8dec9fb1fa477bb17f1f85f2425c51,
title = "Voltammetric characterization of gold, metallized-plastic electrodes, following exposure to ion beams or RF plasmas",
abstract = "Voltammetric analysis for the formation and reduction of gold oxide was used to probe surface compositional changes caused by argon-ion beams or oxygen RF plasmas. Gold, metallized plastic film electrodes were explored because of their reproducible surface composition and electrochemical characteristics, and because of our interest in exploiting the carbonaceous composition of their surface. Low doses of ions (<5 × 1015/cm 2) caused a physical and chemical activation of the gold film surface. Higher ion doses caused degradation of the conductive film which could be monitored electrochemically. Oxygen RF plasmas caused the formation of a voltammetrically quantitable gold oxide-in a fashion not seen for bulk gold or other gold films.",
author = "Armstrong, {Neal R} and White, {J. R.}",
year = "1982",
month = "1",
day = "8",
doi = "10.1016/0022-0728(82)87065-4",
language = "English (US)",
volume = "131",
pages = "121--136",
journal = "Journal of Electroanalytical Chemistry",
issn = "0022-0728",
publisher = "Elsevier Sequoia",
number = "C",

}

TY - JOUR

T1 - Voltammetric characterization of gold, metallized-plastic electrodes, following exposure to ion beams or RF plasmas

AU - Armstrong, Neal R

AU - White, J. R.

PY - 1982/1/8

Y1 - 1982/1/8

N2 - Voltammetric analysis for the formation and reduction of gold oxide was used to probe surface compositional changes caused by argon-ion beams or oxygen RF plasmas. Gold, metallized plastic film electrodes were explored because of their reproducible surface composition and electrochemical characteristics, and because of our interest in exploiting the carbonaceous composition of their surface. Low doses of ions (<5 × 1015/cm 2) caused a physical and chemical activation of the gold film surface. Higher ion doses caused degradation of the conductive film which could be monitored electrochemically. Oxygen RF plasmas caused the formation of a voltammetrically quantitable gold oxide-in a fashion not seen for bulk gold or other gold films.

AB - Voltammetric analysis for the formation and reduction of gold oxide was used to probe surface compositional changes caused by argon-ion beams or oxygen RF plasmas. Gold, metallized plastic film electrodes were explored because of their reproducible surface composition and electrochemical characteristics, and because of our interest in exploiting the carbonaceous composition of their surface. Low doses of ions (<5 × 1015/cm 2) caused a physical and chemical activation of the gold film surface. Higher ion doses caused degradation of the conductive film which could be monitored electrochemically. Oxygen RF plasmas caused the formation of a voltammetrically quantitable gold oxide-in a fashion not seen for bulk gold or other gold films.

UR - http://www.scopus.com/inward/record.url?scp=4243143662&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=4243143662&partnerID=8YFLogxK

U2 - 10.1016/0022-0728(82)87065-4

DO - 10.1016/0022-0728(82)87065-4

M3 - Article

AN - SCOPUS:4243143662

VL - 131

SP - 121

EP - 136

JO - Journal of Electroanalytical Chemistry

JF - Journal of Electroanalytical Chemistry

SN - 0022-0728

IS - C

ER -