Wavelength-independent optical lithography

Stanley K H Pau, O. Nalamasu, R. Cirelli, J. Frackoviak, A. Timko, P. Watson, F. Klemens, G. Timp

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

A multiple exposure photolithographic technique is presented. The resolution of the technique is limited not by exposure wavelength but by processing. This optical lithography was implemented by multiple exposures with two etchings and with single etching. The resulting positive resists started with a bare wafer with a 1000 A oxide atop. The wafer was coated with resist and was exposed to the first mask. Plasma etching was applied twice until the final pattern was achieved.

Original languageEnglish (US)
Pages (from-to)317-320
Number of pages4
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume18
Issue number1
DOIs
StatePublished - Jan 2000
Externally publishedYes

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Photolithography
Etching
Wavelength
Plasma etching
Masks
Oxides
Processing

ASJC Scopus subject areas

  • Engineering(all)

Cite this

Wavelength-independent optical lithography. / Pau, Stanley K H; Nalamasu, O.; Cirelli, R.; Frackoviak, J.; Timko, A.; Watson, P.; Klemens, F.; Timp, G.

In: Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, Vol. 18, No. 1, 01.2000, p. 317-320.

Research output: Contribution to journalArticle

Pau, SKH, Nalamasu, O, Cirelli, R, Frackoviak, J, Timko, A, Watson, P, Klemens, F & Timp, G 2000, 'Wavelength-independent optical lithography', Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, vol. 18, no. 1, pp. 317-320. https://doi.org/10.1116/1.591192
Pau, Stanley K H ; Nalamasu, O. ; Cirelli, R. ; Frackoviak, J. ; Timko, A. ; Watson, P. ; Klemens, F. ; Timp, G. / Wavelength-independent optical lithography. In: Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 2000 ; Vol. 18, No. 1. pp. 317-320.
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