Wavelength-independent optical lithography

S. Pau, O. Nalamasu, R. Cirelli, J. Frackoviak, A. Timko, P. Watson, F. Klemens, G. Timp

Research output: Contribution to journalArticle

2 Scopus citations

Abstract

A multiple exposure photolithographic technique is presented. The resolution of the technique is limited not by exposure wavelength but by processing. This optical lithography was implemented by multiple exposures with two etchings and with single etching. The resulting positive resists started with a bare wafer with a 1000 A oxide atop. The wafer was coated with resist and was exposed to the first mask. Plasma etching was applied twice until the final pattern was achieved.

Original languageEnglish (US)
Pages (from-to)317-320
Number of pages4
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume18
Issue number1
DOIs
StatePublished - Jan 1 2000
Externally publishedYes

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Electrical and Electronic Engineering

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  • Cite this

    Pau, S., Nalamasu, O., Cirelli, R., Frackoviak, J., Timko, A., Watson, P., Klemens, F., & Timp, G. (2000). Wavelength-independent optical lithography. Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, 18(1), 317-320. https://doi.org/10.1116/1.591192