Wet and dry HF-last cleaning process for high-integrity gate oxides

C. Werkhoven, E. Granneman, M. Hendriks, R. De Blank, S. Verhaverbeke, P. Mertens, M. Meuris, W. Vandervorst, M. Heijns, A. Philipossian

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Scopus citations

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Physics & Astronomy

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